Amorphous SiOx nanowires catalyzed by metallic Ge for optoelectronic applications

Journal of Alloys and Compounds

Volumn 509, Issue 9, 2011, Pages 3978-3984

  Nie, Tian Xiao ^a,b   Chen, Zhi Gang ^b   Wu, Yue Qin ^a   Lin, Jian Hui ^a   Zhang, Jiu Zhan ^a   Fan, Yong Liang ^a   Yang, Xin Ju ^a   Jiang, Zui Min ^a   Zou, Jin ^b  

^a FUDAN UNIVERSITY   (China)

^b UNIVERSITY OF QUEENSLAND   (Australia)

Author keywords

Electron microscopy; Growth mechanism; Metallic Ge catalysts; SiOx nanowires; Visible emission

Indexed keywords

AMORPHOUS NANOWIRES; COMPARATIVE EXPERIMENTS; GE-SI ALLOYS; GROWTH MECHANISM; METALLIC GE CATALYSTS; OPTOELECTRONIC APPLICATIONS; PHOTOLUMINESCENCE SPECTRUM; POTENTIAL APPLICATIONS; QUANTUM DOT; SELF-ORGANIZED; SI SUBSTRATES; SIOX NANOWIRES; SOLID-LIQUID-SOLID GROWTHS; SYNTHESIS TEMPERATURES; VISIBLE EMISSIONS; WHITE LIGHT EMITTING DIODES;

CATALYSTS; GERMANIUM; LIGHT EMITTING DIODES; SEMICONDUCTING SILICON COMPOUNDS; SILICON ALLOYS;

NANOWIRES;

EID: 79551689710     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2010.12.199     Document Type: Article

References (53)

1. Y. Cui, and C.M. Lieber Science 291 2001 851 853
2. C. Barrett, R. Gunning, T. Hantschel, K. Arstila, C. O'Sullivan, H. Geaney, and K. Ryan J. Mater. Chem. 20 2010 135 144
3. Z. Chen, L. Cheng, H. Xu, J. Liu, J. Zou, T. Sekiguchi, G. Lu, and H. Cheng Adv. Mater. 22 2010 2376 2380
4. N. Fukata Adv. Mater. 21 2009 2829 2832
5. S. Xu, Y. Wei, M. Kirkham, J. Liu, W. Mai, D. Davidovic, R.L. Snyder, and Z.L. Wang J. Am. Chem. Soc. 130 2008 14958 14959
6. T.-X. Nie, Z.-G. Chen, Y.-Q. Wu, J.-L. Wang, J.-Z. Zhang, Y.-L. Fan, X.-J. Yang, Z.-M. Jiang, and J. Zou J. Phys. Chem. C 114 2010 15370 15376
7. Z.G. Chen, J. Zou, G. Liu, X.D. Yao, F. Li, X.L. Yuan, T. Sekiguchi, G.Q. Lu, and H.M. Cheng Adv. Funct. Mater. 18 2008 3063 3069
8. L. Fu, Z. Chen, D. Wang, L. Cheng, H. Xu, J. Liu, H. Cong, G. Lu, and J. Zou J. Phys. Chem. C 114 2010 9627 9633
9. Z.G. Chen, L.N. Cheng, G.Q. Lu, and J. Zou Nanotechnology 21 2010 375701
10. Y.L. Chiew, and K.Y. Cheong Phys. Rev. E 42 2010 1338 1342
11. P. Yu, Q.L. Hang, Y. Ding, H.Z. Zhang, Z.G. Bai, J.J. Wang, Y.H. Zou, W. Qian, G.C. Xiong, and S.Q. Feng Appl. Phys. Lett. 73 1998 3076 3078
12. X.C. Wu, W.H. Song, K.Y. Wang, T. Hu, B. Zhao, Y.P. Sun, and J.J. Du Chem. Phys. Lett. 336 2001 53 56
13. P. Chen, S. Xie, N. Ren, Y. Zhang, A. Dong, Y. Chen, and Y. Tang J. Am. Chem. Soc. 128 2006 1470 1471
14. S.H. Li, X.F. Zhu, and Y.P. Zhao J. Phys. Chem. B 108 2004 17032 17041
15. L.J. Lauhon, M.S. Gudiksen, C.L. Wang, and C.M. Lieber Nature 420 2002 57 61
16. B. Zheng, Y. Wu, P. Yang, and J. Liu Adv. Mater. 14 2002 122 124
17. J.Q. Hu, Y. Jiang, X.M. Meng, C.S. Lee, and S.T. Lee Chem. Phys. Lett. 367 2003 339 343
18. S.K. Srivastava, P.K. Singh, V.N. Singh, K.N. Sood, D. Haranath, and V. Kumar Phys. Rev. E 41 2009 1545 1549
19. B. Fuhrmann, H.S. Leipner, H.R. Hoche, L. Schubert, P. Werner, and U. Gosele Nano Lett. 5 2005 2524 2527
20. R.S. Wagner, and W.C. Ellis Appl. Phys. Lett. 4 1964 89 90
21. H.F. Yan, Y.J. Xing, Q.L. Hang, D.P. Yu, Y.P. Wang, J. Xu, Z.H. Xi, and S.Q. Feng Chem. Phys. Lett. 323 2000 224 228
22. H.K. Park, B. Yang, S.W. Kim, G.H. Kim, D.H. Youn, S.H. Kim, and S.L. Maeng Phys. Rev. E 37 2007 158 162
23. C.Y. Wang, L.H. Chan, D.Q. Xiao, T.C. Lin, and H.C. Shih J. Vac. Sci. Technol. B 24 2006 613 617
24. Y.J. Xing, D.P. Yu, Z.H. Xi, and Z.Q. Xue Appl. Phys. A: Mater. 76 2003 551 553
25. H.W. Kim, S. Hyun Shim, and J. Woo Lee Phys. Rev. E 37 2007 163 167
26. H.W. Kim, and S.H. Shim Appl. Surf. Sci. 253 2007 3664 3668
27. J.B. Hannon, S. Kodambaka, F.M. Ross, and R.M. Tromp Nature 440 2006 69 71
28. Y.W. Wang, V. Schmidt, S. Senz, and U. Gosele Nat. Nanotechnol. 1 2006 186 189
29. F.X. Xiu, Y. Wang, J. Kim, A. Hong, J.S. Tang, A.P. Jacob, J. Zou, and K.L. Wang Nat. Mater. 9 2010 337 344
30. Y.Q. Wu, J. Zou, F.H. Li, J. Cui, J.H. Lin, R. Wu, and Z.M. Jiang Nanotechnology 18 2007
31. A.I. Yakimov, A.V. Dvurechenskii, A.I. Nikiforov, and Y.Y. Proskuryakov J. Appl. Phys. 89 2001 5676 5681
32. A. Ishizaka, and Y. Shiraki J. Electrochem. Soc. 133 1986 666 671
33. X.Z. Liao, J. Zou, D.J.H. Cockayne, J. Wan, Z.M. Jiang, G. Jin, and K.L. Wang Phys. Rev. B 65 2002 153306
34. D.R. Ou, T. Mori, F. Ye, J. Zou, G. Auchterlonie, and J. Drennan Phys. Rev. B 77 2008 024108
35. Y. Wang, C. Sun, J. Zou, L. Wang, S. Smith, G.Q. Lu, and D.J.H. Cockayne Phys. Rev. B 81 2010 081401
36. D. Wang, S. Penner, D.S. Su, G. Rupprechter, K. Hayek, and R. Schlögl J. Catal. 219 2003 434 441
37. I. Aharonovich, Y. Lifshitz, and S. Tamir Appl. Phys. Lett. 90 2007 263109 263112
38. X.J. Wang, B. Dong, and Z. Zhou Mater. Lett. 63 2009 1149 1152
39. J.H. Kim, and C.S. Yoon J. Phys. Chem. C 112 2008 4463 4468
40. J.H. He, W.W. Wu, Y.L. Chueh, C.L. Hsin, L.J. Chen, and L.J. Chou Appl. Phys. Lett. 87 2005 223102
41. D. Goldberg 3000 Solved Problems in Chemistry 1987 McGraw-Hill
42. J. Elechiguerra, J. Manriquez, and M. Yacaman Appl. Phys. A: Mater. Sci. Process. 79 2004 461 467
43. P. Sekhar, S. Sambandam, D. Sood, and S. Bhansali Nanotechnology 17 2006 4606 4613
44. P. Wu, X.Q. Zou, L.F. Chi, Q. Li, and T. Xiao Nanotechnology 18 2007 125601 125606
45. J. Wan, G.L. Jin, Z.M. Jiang, Y.H. Luo, J.L. Liu, and K.L. Wang Appl. Phys. Lett. 78 2001 1763 1765
46. J. Wan, Y. Luo, Z. Jiang, G. Jin, J. Liu, K. Wang, X. Liao, and J. Zou J. Appl. Phys. 90 2001 4290 4292
47. H. Nishikawa, T. Shiroyama, R. Nakamura, Y. Ohki, K. Nagasawa, and Y. Hama Phys. Rev. B 45 1992 586 591
48. Z.Y. Zhang, X.L. Wu, J.C. Shen, L.L. Xu, and P.K. Chu Appl. Phys. Lett. 91 2007 193111 193113
49. Y. Hao, G. Meng, C. Ye, and L. Zhang Appl. Phys. Lett. 87 2005 033106
50. P. Chawla, S.P. Lochab, and N. Singh J. Alloy Compd. 509 2011 72 75
51. Y. Chen, G.Z. Ran, Y.K. Sun, Y.B. Wang, J.S. Fu, W.-T. Chen, Y.-Y. Gong, D.-X. Wu, Z.C. Ma, W.H. Zong, and G.G. Qin Nucl. Instrum. Methods Phys. Res. Sect. B: Beam Interact. Mater. Atoms 183 2001 305 310
52. R.A.B. Devine, D. Mathiot, W.L. Warren, D.M. Fleetwood, and B. Aspar Appl. Phys. Lett. 63 1993 2926 2928
53. J.K. Park, C.H. Kim, S.H. Park, H.D. Park, and S.Y. Choi Appl. Phys. Lett. 84 2004 1647 1649