Fabrication of submicron metallic grids with interference and phase-mask holography

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 10, Issue 1, 2011, Pages

  Park, Joong Mok ^a,b   Kim, Tae Geun ^c   Constant, Kristen ^a,b   Ho, Kai Ming ^a,b  

^a U S DEPARTMENT OF ENERGY   (United States)

^b IOWA STATE UNIVERSITY   (United States)

^c Korea University   (South Korea)

Author keywords

complex nanostructures; fabrication and characterization nanoscale materials; holographic interferometry; methods of micro and nanofabrication; photonic bandgap materials

Indexed keywords

ELECTRODEPOSITION; ENERGY GAP; FABRICATION; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; PHOTONIC DEVICES; PHOTORESISTS; REDUCTION; SPONTANEOUS EMISSION;

COMPLEX NANOSTRUCTURES; DIFFRACTED BEAMS; ELECTROCHEMICAL DEPOSITION; METALLIC GRID; METALLIC MESH; METHODS OF MICRO- AND NANOFABRICATION; NANO-SCALE MATERIALS; PHASE MASKS; PHOTONIC BANDGAP MATERIALS; PHOTORESIST GRATINGS; POLYMER TEMPLATES; SUBMICRON; TWO-BEAM INTERFERENCE;

HOLOGRAPHIC INTERFEROMETRY;

EID: 79551633866     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3541794     Document Type: Article

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