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Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 29, Issue 1, 2011, Pages 0110021-0110027

Formation of silicon grass: Nanomasking by carbon clusters in cyclic deep reactive ion etching

(5) Leopold, Steffen a Kremin, Christoph a Ulbrich, Angela a Krischok, Stefan a Hoffmann, Martin a

a ILMENAU UNIVERSITY OF TECHNOLOGY (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON CLUSTERS; DESIGN OF EXPERIMENTS; PASSIVATION; SEMICONDUCTING SILICON COMPOUNDS; SILICON CARBIDE; SILICON OXIDES; SILICON WAFERS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON LAYERS; CLUSTER FORMATIONS; DEEP REACTIVE ION ETCHING; NANOMASKS; NANOSTRUCTURED SURFACE; PROCESS ANALYSIS; SI-CONTAINING COMPOUNDS; SILICON SURFACES;

REACTIVE ION ETCHING;

EID: 79551622711 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3521490 Document Type: Conference Paper

Times cited : (30)

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