Gas phase optical emission spectroscopy during remote plasma chemical vapour deposition of GaN and relation to the growth dynamics

Journal of Physics D: Applied Physics

Volumn 44, Issue 4, 2011, Pages

  Corr, Cormac ^a   Boswell, Rod ^a   Carman, Robert ^b  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

^b MACQUARIE UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOUR DEPOSITION; EXCITED SPECIES; GAN FILM; GAN GROWTH; GAS-PHASE SPECIES; GASPHASE; GROWTH DYNAMICS; MONITORING TOOLS; REMOTE PLASMAS; SOURCE SPECTRUM; TRIMETHYL GALLIUM;

CHEMICAL VAPOR DEPOSITION; DEPOSITION; DIAMOND FILMS; ECOLOGY; EMISSION SPECTROSCOPY; GALLIUM ALLOYS; GALLIUM NITRIDE; GAS DYNAMICS; GASES; LIGHT EMISSION; NITROGEN PLASMA; OPTICAL EMISSION SPECTROSCOPY; OPTICAL FILMS; PLASMA DEPOSITION;

FILM GROWTH;

EID: 79251589040     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/44/4/045201     Document Type: Article

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