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Volumn 22, Issue 2, 2011, Pages

Characterizing a scatterfield optical platform for semiconductor metrology

Author keywords

K hler illumination; Microscope characterization; Scatterfield microscopy; Semiconductor metrology

Indexed keywords

CHARACTERIZATION;

EID: 79251481118     PISSN: 09570233     EISSN: 13616501     Source Type: Journal    
DOI: 10.1088/0957-0233/22/2/024003     Document Type: Article
Times cited : (20)

References (16)
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    • (1998) Appl. Opt. , vol.37 , pp. 5112-5115
    • Minhas, B.K.1    Coulombe, S.A.2    Naqvi, S.S.H.3    McNeil, J.R.4
  • 3
    • 79251494391 scopus 로고    scopus 로고
    • Full wafer macro-CD imaging for excursion control of fast patterning processes
    • Markwort L, Kappel C, Kharrazian R and Guittet P 2010 Full wafer macro-CD imaging for excursion control of fast patterning processes Proc. SPIE 7638 763807
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    • Markwort, L.1    Kappel, C.2    Kharrazian, R.3    Guittet, P.4
  • 4
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    • Sensitivity analysis of grating parameter estimation
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    • (2002) Appl. Opt. , vol.41 , pp. 7179-7186
    • Logofǎtu, P.C.1
  • 6
    • 79251527168 scopus 로고    scopus 로고
    • Stability of polarimetric grating characterization with beam spot larger than grating box
    • Foldyna M., Licitra C. and De Martino A 2010 Stability of polarimetric grating characterization with beam spot larger than grating box Proc. SPIE 7638 76381I
    • (2010) Proc. SPIE , vol.7638
    • Foldyna, M.1    Licitra, C.2    De Martino, A.3
  • 10
    • 33750466565 scopus 로고    scopus 로고
    • Illumination optimization for optical semiconductor metrology
    • Barnes B M, Howard L P and Silver R M 2006 Illumination optimization for optical semiconductor metrology Proc. SPIE 6289 62890P
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    • Barnes, B.M.1    Howard, L.P.2    Silver, R.M.3
  • 11
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    • Ein neues Beleuchtungsverfahren fur mikrophotographische
    • Köhler A 1883 Ein neues Beleuchtungsverfahren fur mikrophotographische Zwecke. Z. f. Wiss. Mikroscopie 10 433
    • (1883) Zwecke. Z. F. Wiss. Mikroscopie , vol.10 , pp. 433
    • Köhler, A.1
  • 13
    • 79251503871 scopus 로고    scopus 로고
    • Sub-50-nm critical dimension measurements using a 193-nm angle-resolved scatterfield microscope
    • Quintanilha R, Sohn Y J, Barnes B M and Silver R 2010 Sub-50-nm critical dimension measurements using a 193-nm angle-resolved scatterfield microscope Proc. SPIE 7638 76381E
    • (2010) Proc. SPIE , vol.7638
    • Quintanilha, R.1    Sohn, Y.J.2    Barnes, B.M.3    Silver, R.4
  • 14
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    • Zero-order imaging of device-sized overlay targets using scatterfield microscopy
    • Barnes B M, Howard L P, Jun. J, Lipscomb P and Silver R M 2007 Zero-order imaging of device-sized overlay targets using scatterfield microscopy Proc. SPIE 6518 65180F
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    • Barnes, B.M.1    Howard, L.P.2    Jun, J.3    Lipscomb, P.4    Silver, R.M.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.