-
1
-
-
0029346243
-
Metrology of subwavelength photoresist gratings using optical scatterometry
-
Raymond C J, Murnane M R, Sohail S, Naqvi H and McNeil J R 1995 Metrology of subwavelength photoresist gratings using optical scatterometry J. Vac. Sci. Technol. B 13 1484-95
-
(1995)
J. Vac. Sci. Technol. B
, vol.13
, pp. 1484-1495
-
-
Raymond, C.J.1
Murnane, M.R.2
Sohail, S.3
Naqvi, H.4
McNeil, J.R.5
-
2
-
-
0000092278
-
Ellipsometric scatterometry for the metrology of sub-0.1-μm-linewidth structures
-
Minhas B K, Coulombe S A, Naqvi S S H and McNeil J R 1998 Ellipsometric scatterometry for the metrology of sub-0.1-μm-linewidth structures Appl. Opt. 37 5112-5
-
(1998)
Appl. Opt.
, vol.37
, pp. 5112-5115
-
-
Minhas, B.K.1
Coulombe, S.A.2
Naqvi, S.S.H.3
McNeil, J.R.4
-
3
-
-
79251494391
-
Full wafer macro-CD imaging for excursion control of fast patterning processes
-
Markwort L, Kappel C, Kharrazian R and Guittet P 2010 Full wafer macro-CD imaging for excursion control of fast patterning processes Proc. SPIE 7638 763807
-
(2010)
Proc. SPIE
, vol.7638
, pp. 763807
-
-
Markwort, L.1
Kappel, C.2
Kharrazian, R.3
Guittet, P.4
-
4
-
-
0036901883
-
Sensitivity analysis of grating parameter estimation
-
Logofǎtu P C 2002 Sensitivity analysis of grating parameter estimation Appl. Opt. 41 7179-86
-
(2002)
Appl. Opt.
, vol.41
, pp. 7179-7186
-
-
Logofǎtu, P.C.1
-
5
-
-
35148880658
-
Fundamental limits of optical critical dimension metrology: A simulation study
-
Silver R, Germer T, Attota R, Barnes B M, Bunday B, Allgair J, Marx E and Jun. J 2007 Fundamental limits of optical critical dimension metrology: a simulation study Proc. SPIE 6518 65180U
-
(2007)
Proc. SPIE
, vol.6518
-
-
Silver, R.1
Germer, T.2
Attota, R.3
Barnes, B.M.4
Bunday, B.5
Allgair, J.6
Marx, E.7
Jun, J.8
-
6
-
-
79251527168
-
Stability of polarimetric grating characterization with beam spot larger than grating box
-
Foldyna M., Licitra C. and De Martino A 2010 Stability of polarimetric grating characterization with beam spot larger than grating box Proc. SPIE 7638 76381I
-
(2010)
Proc. SPIE
, vol.7638
-
-
Foldyna, M.1
Licitra, C.2
De Martino, A.3
-
7
-
-
34548496725
-
Scatterfield microscopy for extending the limits of image-based optical metrology
-
Silver R M, Barnes B M, Attota R, Jun. J, Stocker M, Marx E and Patrick H J 2007 Scatterfield microscopy for extending the limits of image-based optical metrology Appl. Opt. 46 4248-57
-
(2007)
Appl. Opt.
, vol.46
, pp. 4248-4257
-
-
Silver, R.M.1
Barnes, B.M.2
Attota, R.3
Jun, J.4
Stocker, M.5
Marx, E.6
Patrick, H.J.7
-
8
-
-
40749137817
-
Optical critical dimension measurement of silicon grating targets using back focal plane scatterfield microscopy
-
Patrick H J, Attota R, Barnes B M, Germer T A, Dixson R G, Stocker M T, Silver R M and Bishop M R 2008 Optical critical dimension measurement of silicon grating targets using back focal plane scatterfield microscopy J. Micro/Nanolith. MEMS MOEMS 7 013012
-
(2008)
J. Micro/Nanolith. MEMS MOEMS
, vol.7
, pp. 013012
-
-
Patrick, H.J.1
Attota, R.2
Barnes, B.M.3
Germer, T.A.4
Dixson, R.G.5
Stocker, M.T.6
Silver, R.M.7
Bishop, M.R.8
-
9
-
-
24644432953
-
Optical fourier transform scatterometry for LER and LWR metrology
-
DOI 10.1117/12.594526, 21, Metrology, Inspection, and Process Control for Microlithography XIX
-
Boher P, Petit J, Leroux T, Foucher J, Desieres Y, Hazart J and Chaton P 2005 Optical Fourier transform scatterometry for LER and LWR metrology Proc. SPIE 5752 192-203 (Pubitemid 41275270)
-
(2005)
Progress in Biomedical Optics and Imaging - Proceedings of SPIE
, vol.5752
, Issue.I
, pp. 192-203
-
-
Boher, P.1
Petit, J.2
Leroux, T.3
Foucher, J.4
Desieres, Y.5
Hazart, J.6
Chaton, P.7
-
10
-
-
33750466565
-
Illumination optimization for optical semiconductor metrology
-
Barnes B M, Howard L P and Silver R M 2006 Illumination optimization for optical semiconductor metrology Proc. SPIE 6289 62890P
-
(2006)
Proc. SPIE
, vol.6289
-
-
Barnes, B.M.1
Howard, L.P.2
Silver, R.M.3
-
11
-
-
0001666930
-
Ein neues Beleuchtungsverfahren fur mikrophotographische
-
Köhler A 1883 Ein neues Beleuchtungsverfahren fur mikrophotographische Zwecke. Z. f. Wiss. Mikroscopie 10 433
-
(1883)
Zwecke. Z. F. Wiss. Mikroscopie
, vol.10
, pp. 433
-
-
Köhler, A.1
-
13
-
-
79251503871
-
Sub-50-nm critical dimension measurements using a 193-nm angle-resolved scatterfield microscope
-
Quintanilha R, Sohn Y J, Barnes B M and Silver R 2010 Sub-50-nm critical dimension measurements using a 193-nm angle-resolved scatterfield microscope Proc. SPIE 7638 76381E
-
(2010)
Proc. SPIE
, vol.7638
-
-
Quintanilha, R.1
Sohn, Y.J.2
Barnes, B.M.3
Silver, R.4
-
14
-
-
35148855036
-
Zero-order imaging of device-sized overlay targets using scatterfield microscopy
-
Barnes B M, Howard L P, Jun. J, Lipscomb P and Silver R M 2007 Zero-order imaging of device-sized overlay targets using scatterfield microscopy Proc. SPIE 6518 65180F
-
(2007)
Proc. SPIE
, vol.6518
-
-
Barnes, B.M.1
Howard, L.P.2
Jun, J.3
Lipscomb, P.4
Silver, R.M.5
-
15
-
-
79251518215
-
The limits and extensibility of optical patterned defect inspection
-
Silver R M, Barnes B M, Sohn Y, Quintanilha R, Zhou H, Deeb C, Johnson M, Goodwin M and Patel D 2010 The limits and extensibility of optical patterned defect inspection Proc. SPIE 7638 76380J
-
(2010)
Proc. SPIE
, vol.7638
-
-
Silver, R.M.1
Barnes, B.M.2
Sohn, Y.3
Quintanilha, R.4
Zhou, H.5
Deeb, C.6
Johnson, M.7
Goodwin, M.8
Patel, D.9
-
16
-
-
66649112487
-
Through-focus scanning and scatterfield optical methods for advanced overlay target analysis
-
Attota R, Stocker M, Silver R, Heckert A, Zhou H, Kasica R, Chen L, Dixson R, Orji G, Barnes B and Lipscomb P 2009 Through-focus scanning and scatterfield optical methods for advanced overlay target analysis Proc. SPIE 7272 727214
-
(2009)
Proc. SPIE
, vol.7272
, pp. 727214
-
-
Attota, R.1
Stocker, M.2
Silver, R.3
Heckert, A.4
Zhou, H.5
Kasica, R.6
Chen, L.7
Dixson, R.8
Orji, G.9
Barnes, B.10
Lipscomb, P.11
|