The limits and extensibility of optical patterned defect inspection

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7638, Issue , 2010, Pages

  Silver, Richard M ^a   Barnes, Bryan M ^a   Sohn, Yeungjoon ^a   Quintanilha, Richard ^a   Zhou, Hui ^a   Deeb, Chris ^b   Johnson, Mark ^c   Goodwin, Milton ^c   Patel, Dilip ^c  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b INTEL CORPORATION   (United States)

^c SEMATECH   (United States)

Author keywords

defect detection; defect metrology; defect sensitivity; scatterfield microscopy

Indexed keywords

BRIGHTFIELD; COMPREHENSIVE MODELING; DEFECT ANALYSIS; DEFECT ARRAYS; DEFECT DETECTION; DEFECT INSPECTION; DEFECT SENSITIVITY; DEFECT SIZE; DEFECT TYPE; ELECTROMAGNETIC SIMULATION; FINITE DIFFERENCE TIME DOMAINS; LOGIC CELLS; NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY; OPTICAL TOOLS; PATTERNED DEFECTS; SCATTERED FIELD; SCATTERFIELD MICROSCOPY; SEMATECH; SYSTEMATIC EVALUATION; THEORETICAL SIMULATION;

DIES; FINITE DIFFERENCE TIME DOMAIN METHOD; FUNCTION EVALUATION; INSPECTION; LOGIC DEVICES; MEASUREMENTS; OPTICAL MICROSCOPY; POLYSILICON; PROCESS CONTROL; RATING; TIME DOMAIN ANALYSIS; UNITS OF MEASUREMENT;

DEFECTS;

EID: 79251518215     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.850935     Document Type: Conference Paper

References (9)

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