Zero-order imaging of device-sized overlay targets using scatterfield microscopy

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6518, Issue PART 1, 2007, Pages

  Barnes, Bryan M ^a   Howard, Lowell P ^a,b   Jun, Jay ^a   Lipscomb, Pete ^c   Silver, Richard M ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b Precera Inc   (United States)

^c SEMATECH   (United States)

Author keywords

Bright field microscopy; Microscope objective; Overlay metrology; Polarization; Scatterfield microscopy; Scatterometry

Indexed keywords

BRIGHT FIELD MICROSCOPY; FINITE GRATINGS; MICROSCOPE OBJECTIVES; NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY (NIST); OVERLAY METROLOGY; SCATTERFIELD MICROSCOPY; SCATTEROMETRY;

IMAGE ANALYSIS; LIGHT SCATTERING; LIGHT TRANSMISSION; PHOTOLITHOGRAPHY; SILICON WAFERS;

OPTICAL MICROSCOPY;

EID: 35148855036     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.716457     Document Type: Conference Paper

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