Microporous silica thin films with low refractive indices and high Young's modulus

ACS Applied Materials and Interfaces

Volumn 2, Issue 11, 2010, Pages 3128-3133

  Shimizu, Wataru ^a   Murakami, Yasushi ^a  

^a SHINSHU UNIVERSITY   (Japan)

Author keywords

antireflection; catalytic sol gel process; dielectric constant; low k; porosity; refractive index; template free

Indexed keywords

ANTI-REFLECTION; DIELECTRIC CONSTANTS; HIGH-STRENGTH; HYDROXYACETONE; LOW REFRACTIVE INDEX; LOW-K; LOW-TEMPERATURE FABRICATION; MICRO-POROUS; MICROPOROUS SILICA; NITROGEN ADSORPTION-DESORPTION; ORTHOSILICATE; SACRIFICIAL REAGENT; SOL-GEL SYNTHESIS; SYNTHESIS METHOD; SYNTHESIZED SILICA; TEMPLATE-FREE; TETRAMETHYL; TRANSMISSION ELECTRON MICROSCOPE; YOUNG'S MODULUS;

DESORPTION; ELASTIC MODULI; ELASTICITY; ETHANOL; GAS ADSORPTION; GELS; LIGHT REFRACTION; MICROPOROSITY; NANOSTRUCTURED MATERIALS; ORGANIC POLYMERS; PERMITTIVITY; REFRACTIVE INDEX; REFRACTOMETERS; SILICA; SOL-GELS; SOLS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

SOL-GEL PROCESS;

EID: 79151474341     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am100612g     Document Type: Article

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