-
7
-
-
65249087836
-
-
Clark AE, Yoo JH, Cullen JR, Wun-Fogle M, Petculescu G, Flatau A. J Appl Phys 2009;105:07A913.
-
(2009)
J Appl Phys
, vol.105
-
-
Clark, A.E.1
Yoo, J.H.2
Cullen, J.R.3
Wun-Fogle, M.4
Petculescu, G.5
Flatau, A.6
-
10
-
-
65249086701
-
-
McClure A, Albert S, Jaeger T, Li H, Rugheimer P, Schaefer JA, et al. J Appl Phys 2009;105:07A938.
-
(2009)
J Appl Phys
, vol.105
-
-
McClure, A.1
Albert, S.2
Jaeger, T.3
Li, H.4
Rugheimer, P.5
Schaefer, J.A.6
-
16
-
-
51749089511
-
-
Hattrick-Simpers JR, Hunter D, Craciunescu CM, Jang KS, Murakami M, Cullen J, et al. Appl Phys Lett 2008;93:102507.
-
(2008)
Appl Phys Lett
, vol.93
, pp. 102507
-
-
Hattrick-Simpers, J.R.1
Hunter, D.2
Craciunescu, C.M.3
Jang, K.S.4
Murakami, M.5
Cullen, J.6
-
17
-
-
36049044492
-
-
Hattrick-Simpers JR, Jun C, Murakami M, Orozco A, Knauss L, Booth RJ, et al. Appl Surf Sci 2007;254:734.
-
(2007)
Appl Surf Sci
, vol.254
, pp. 734
-
-
Hattrick-Simpers, J.R.1
Jun, C.2
Murakami, M.3
Orozco, A.4
Knauss, L.5
Booth, R.J.6
-
19
-
-
0038654437
-
-
Clark AE, Hathaway KB, Wun-Fogle M, Restorff JB, Lograsso TA, Keppens VM, et al. J Appl Phys 2003;93:8621.
-
(2003)
J Appl Phys
, vol.93
, pp. 8621
-
-
Clark, A.E.1
Hathaway, K.B.2
Wun-Fogle, M.3
Restorff, J.B.4
Lograsso, T.A.5
Keppens, V.M.6
-
22
-
-
46449093907
-
-
Morley NA, Yeh SL, Rigby S, Javed A, Gibbs MRJ. J Vac Sci Technol A 2008;26:581.
-
(2008)
J Vac Sci Technol A
, vol.26
, pp. 581
-
-
Morley, N.A.1
Yeh, S.L.2
Rigby, S.3
Javed, A.4
Gibbs, M.R.J.5
-
29
-
-
33751339466
-
-
Borrego JM, Blazquez JS, Conde CF, Conde A, Roth S. Intermetallics 2007;15:193.
-
(2007)
Intermetallics
, vol.15
, pp. 193
-
-
Borrego, J.M.1
Blazquez, J.S.2
Conde, C.F.3
Conde, A.4
Roth, S.5
-
30
-
-
48949086810
-
-
Basumatary H, Palit M, Chelvane JA, Pandian S, Raja MM, Chandrasekaran V. Scripta Mater 2008;59:878.
-
(2008)
Scripta Mater
, vol.59
, pp. 878
-
-
Basumatary, H.1
Palit, M.2
Chelvane, J.A.3
Pandian, S.4
Raja, M.M.5
Chandrasekaran, V.6
-
32
-
-
33646871841
-
-
Liu GD, Dai XF, Liu ZH, Chen JL, Wu GH. J Appl Phys 2006;99:093904.
-
(2006)
J Appl Phys
, vol.99
, pp. 093904
-
-
Liu, G.D.1
Dai, X.F.2
Liu, Z.H.3
Chen, J.L.4
Wu, G.H.5
-
33
-
-
0037450361
-
-
Lograsso TA, Ross AR, Schlagel DL, Clark AE, Wun-Fogle M. J Alloys Compd 2003;350:95.
-
(2003)
J Alloys Compd
, vol.350
, pp. 95
-
-
Lograsso, T.A.1
Ross, A.R.2
Schlagel, D.L.3
Clark, A.E.4
Wun-Fogle, M.5
-
34
-
-
0037121709
-
-
Ikeda O, Kainuma R, Ohnuma I, Fukamichi K, Ishida K. J Alloys Compd 2002;347:198.
-
(2002)
J Alloys Compd
, vol.347
, pp. 198
-
-
Ikeda, O.1
Kainuma, R.2
Ohnuma, I.3
Fukamichi, K.4
Ishida, K.5
-
36
-
-
13744251894
-
-
Bormio-Nunes CM, Tirelli A, Turtelli RS, Grössinger R, Mü ller H, Wiesinger G, et al. J Appl Phys 2005;97:033901.
-
(2005)
J Appl Phys
, vol.97
, pp. 033901
-
-
Bormio-Nunes, C.M.1
Tirelli, A.2
Turtelli, R.S.3
Grössinger, R.4
Müller, H.5
Wiesinger, G.6
-
41
-
-
42949166707
-
-
Reddy AS, Park HH, Reddy VS, Reddy KVS, Sarma NS, Kaleemulla S, et al. Mater Chem Phys 2008;110:397.
-
(2008)
Mater Chem Phys
, vol.110
, pp. 397
-
-
Reddy, A.S.1
Park, H.H.2
Reddy, V.S.3
Reddy, K.V.S.4
Sarma, N.S.5
Kaleemulla, S.6
-
42
-
-
84860332996
-
-
New York: AVS Education Committee Book Series
-
Westwood WD. Sputter deposition, vol. 2. New York: AVS Education Committee Book Series; 2003.
-
(2003)
Sputter Deposition
, vol.2
-
-
Westwood, W.D.1
-
45
-
-
53449099682
-
-
Ruffoni MP, Pascarelli S, Grossinger R, Turtelli RS, Bormio-Nunes C, Pettifer RF. Phys Rev Lett 2008;101:147202.
-
(2008)
Phys Rev Lett
, vol.101
, pp. 147202
-
-
Ruffoni, M.P.1
Pascarelli, S.2
Grossinger, R.3
Turtelli, R.S.4
Bormio-Nunes, C.5
Pettifer, R.F.6
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