Effect of sputtering power on the physical properties of dc magnetron sputtered copper oxide thin films

Materials Chemistry and Physics

Volumn 110, Issue 2-3, 2008, Pages 397-401

  Reddy, A Sivasankar ^a,b   Park, Hyung Ho ^a   Reddy, V Sahadeva ^b   Reddy, K V S ^b   Sarma, N S ^b   Kaleemulla, S ^b   Uthanna, S ^b   Reddy, P Sreedhara ^b  

^a Yonsei University   (South Korea)

^b SRI VENKATESWARA UNIVERSITY   (India)

Author keywords

Electrical properties; Optical properties; Oxides; Sputtering

Indexed keywords

ARGON; COPPER OXIDES; ELECTRIC CONDUCTIVITY; HALL MOBILITY; MAGNETRON SPUTTERING; OPTICAL BAND GAPS; POLYCRYSTALLINE MATERIALS;

CUBIC STRUCTURE; SINGLE PHASE FILMS; SPUTTERING POWER;

THIN FILMS;

EID: 42949166707     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2008.02.031     Document Type: Article

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