Orthogonal optimization for room temperature magnetron sputtering of ZnO:Al films for all-solid electrochromic devices

Applied Surface Science

Volumn 257, Issue 8, 2011, Pages 3748-3752

  Wang, Tao ^a   Diao, Xungang ^a   Ding, Peng ^a  

^a BEIHANG UNIVERSITY   (China)

Author keywords

Electrochromic device; Magnetron sputtering; Orthogonal design; ZAO films

Indexed keywords

ALUMINUM OXIDE; CARRIER CONCENTRATION; ELECTROCHROMIC DEVICES; ELECTROCHROMISM; II-VI SEMICONDUCTORS; INDIUM COMPOUNDS; MAGNETRON SPUTTERING; TIN OXIDES; TRANSPARENT ELECTRODES; TUNGSTEN COMPOUNDS; ZINC OXIDE;

COMPREHENSIVE PERFORMANCE; ELECTROCHROMIC PERFORMANCE; INDIUM TIN OXIDE FILMS; OPTICAL AND ELECTRICAL PROPERTIES; ORTHOGONAL DESIGN; ORTHOGONAL OPTIMIZATIONS; REACTIVE MAGNETRON SPUTTERING; TARGET-SUBSTRATE DISTANCE;

OXIDE FILMS;

EID: 78651357052     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.11.131     Document Type: Article

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