Preparation and characterization of Al doped ZnO thin films textured on glass at low temperature by RF reactive co-sputtering

Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors

Volumn 24, Issue 6, 2003, Pages 606-611

  Shao, Lexi ^a,b   Chang, Kuenhuei ^b   Hwang, Heuyliang ^b  

^a LINGNAN NORMAL UNIVERSITY   (China)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Al doped zinc oxide film; Low substrate temperature; Non annealing; RF reactive co sputtering; Textured growth

Indexed keywords

ALUMINUM; GLASS; MAGNETRON SPUTTERING; ZINC OXIDE;

LOW SUBSTRATE TEMPERATURE; TEXTURED GROWTH;

THIN FILMS;

EID: 0042819601     PISSN: 02534177     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (9)

1. Chen Meng, Bai Xuedong, Huang Rongfang, et al. Structure and conductive mechanism of ITO and ZAO films. Chinese Journal of Semiconductors, 2000, 21: 394 (in Chinese)
2. Liu Shuman, Liu Fengqi, Guo Haiqing, et al. Investigation on structure and luminescence of ZnO:Tb nanocrystals. Chinese Journal of Semiconductors, 2001, 22: 418 (in Chinese)
3. Song Dengyuan, Wang Yongqing, Sun Rongxia, et al. The influences of Ar pressure on the properties of ZnO:Al thin films by RF magnetron sputtering. Chinese Journal of Semiconductors, 2002, 23: 1078 (in Chinese)
4. Ye Zhizhcn, Chen Hanhong, Liu Rong, et al. Structure and PI, spectrum of ZnO films prepared by DC magnetron sputtering. Chinese Journal of Semiconductors, 2001, 22: 1015 (in Chinese)
5. Goh E G, Gong H. Crystal growth of Al-doped ZnO films under different sputtering conditions. Intern J Mord Phys B, 2002,16: 287
6. Jager S, Szyszka B, Szczyrbowski J, et al. Optical and electrical properties of doped Zinc oxide films prepared DC reactive magnetron sputtering. J Non-Cryst Solids, 1997, 218: 74
7. Shao Lexi, Huang Chunming, Liu Xiaoping, et al. Transparent zinc oxide thin films prepared by DC diode reactive sputtering. Vacuum Electronics, 2002, 2: 13 (in Chinese)
8. Haug F, Geller Zs, Zogg H, et al. Influence of deposition conditions on the thermal stability of ZnO:Al films grown by rf magnetron sputtering. J Vac Sci Technol A, 2001, 19: 171
9. Zhang W L, Wang H, Wong K S, et al. Third-order optical nonlinearity in microcrystallite ZnO thin films. Appl Phys Lett, 1999, 75: 3321