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Advanced Materials Research

Volumn 126-128, Issue , 2010, Pages 935-939

The research of modulation period on photoelectric properties of Ti/TiN multilayer films

(2) Hu, Min a Liu, Ying a

a NANCHANG UNIVERSITY (China)

Author keywords

Magnetron sputtering; Modulation periods; Reflectivity; Sheet resistance; Ti TiN multilayer films

Indexed keywords

INTERFACIAL LAYER; LAYER THICKNESS; LAYERED STRUCTURES; MODULATION PERIOD; MODULATION PERIODS; MULTI-LAYERED; NEAR INFRARED REFLECTANCE; NEAR INFRARED REGION; NUMBER OF LAYERS; OPTICAL REFLECTANCE; OPTIMUM THICKNESS; PHOTOELECTRIC PROPERTY; REACTIVE DC MAGNETRON SPUTTERING; REFLECTIVITY; SI(111) SUBSTRATE;

ABRASIVES; ELECTRIC RESISTANCE; FILM PREPARATION; INFRARED DEVICES; MAGNETRON SPUTTERING; MODULATION; MULTILAYERS; REFLECTION; SHEET RESISTANCE;

MULTILAYER FILMS;

EID: 78650948663 PISSN: 10226680 EISSN: None Source Type: Book Series
DOI: 10.4028/www.scientific.net/AMR.126-128.935 Document Type: Conference Paper

Times cited : (3)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.