SCOPUS 정보 검색 플랫폼 - 논문 보기

메뉴 건너뛰기

Journal of Materials Chemistry

Volumn 19, Issue 24, 2009, Pages 4085-4087

A UV curable resin with reworkable properties: Application to imprint lithography

(6) Matsukawa, Daisaku a Wakayama, Hiroyuki a Mitsukura, Kazuyuki a Okamura, Haruyuki a Hirai, Yoshihiko a Shirai, Masamitsu a

a Osaka Prefecture University (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIFUNCTIONAL; HEMIACETAL ESTER; IMPRINT LITHOGRAPHY; METHACRYLATE MONOMERS; PHOTOINDUCED DEGRADATION; UV CURABLE; UV-CURING;

CURING; ESTERS; MONOMERS; RESINS;

NANOIMPRINT LITHOGRAPHY;

EID: 67149143397 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/b905188k Document Type: Article

Times cited : (18)

References (24)

1
- 0142037327
- S. Y. Chou P. R. Krauss P. Renstrom J. Appl. Phys. Lett. 1995 67 3114
- (1995) J. Appl. Phys. Lett. , vol.67 , pp. 3114
- Chou, S.Y.¹ Krauss, P.R.² Renstrom, P.³

2
- 5344241941
- S. Y. Chou P. R. Krauss P. J. Renstrom J. Vac. Sci. Technol. 1996 B14 4129
- (1996) J. Vac. Sci. Technol. , vol.14 , pp. 4129
- Chou, S.Y.¹ Krauss, P.R.² Renstrom, P.J.³

3
- 0032625408
- M. Colburn S. Johnson M. Stewart S. Damel T. Bailey B. Choi M. Wedlake T. Michaelson S. V. Sreenivasan J. Ekerdt C. G. Willson Proc. SPIE 1999 3676 379
- (1999) Proc. SPIE , vol.3676 , pp. 379
- Colburn, M.¹ Johnson, S.² Stewart, M.³ Damel, S.⁴ Bailey, T.⁵ Choi, B.⁶ Wedlake, M.⁷ Michaelson, T.⁸ Sreenivasan, S.V.⁹ Ekerdt, J.¹⁰ Willson, C.G.¹¹

4
- 39749104292
- W. H. Heath F. Palmieri J. R. Adams B. K. Long J. Chute T. W. Holcombe S. Zieren M. J. Truitt J. L. White C. G. Willson Macromolecules 2008 41 719
- (2008) Macromolecules , vol.41 , pp. 719
- Heath, W.H.¹ Palmieri, F.² Adams, J.R.³ Long, B.K.⁴ Chute, J.⁵ Holcombe, T.W.⁶ Zieren, S.⁷ Truitt, M.J.⁸ White, J.L.⁹ Willson, C.G.¹⁰

5
- 0029778032
- S. L. Buchwalter L. L. Kosbar J. Polym. Sci., Part A: Polym. Chem. 1996 34 249
- (1996) J. Polym. Sci., Part A: Polym. Chem. , vol.34 , pp. 249
- Buchwalter, S.L.¹ Kosbar, L.L.²

6
- 0001223016
- K. Ogino J. Chen C. K. Ober Chem. Mater. 1998 10 3833
- (1998) Chem. Mater. , vol.10 , pp. 3833
- Ogino, K.¹ Chen, J.² Ober, C.K.³

7
- 0000498052
- S. Yang J. Chen H. Korner T. Breiner C. K. Ober Chem. Mater. 1998 10 1475
- (1998) Chem. Mater. , vol.10 , pp. 1475
- Yang, S.¹ Chen, J.² Korner, H.³ Breiner, T.⁴ Ober, C.K.⁵

8
- 0032658965
- L. Wang C. P. Wong J. Polym. Sci., Part A: Polym. Chem. 1999 37 2991
- (1999) J. Polym. Sci., Part A: Polym. Chem. , vol.37 , pp. 2991
- Wang, L.¹ Wong, C.P.²

9
- 0034298914
- L. Wang H. Li C. P. Wong J. Polym. Sci., Part A: Polym. Chem. 2000 38 3771
- (2000) J. Polym. Sci., Part A: Polym. Chem. , vol.38 , pp. 3771
- Wang, L.¹ Li, H.² Wong, C.P.³

10
- 0035850873
- J.-S. Chen C. K. Ober M. D. Poliks Polymer 2002 43 131
- (2002) Polymer , vol.43 , pp. 131
- Chen, J.-S.¹ Ober, C.K.² Poliks, M.D.³

11
- 0036604403
- H. Li L. Wang K. Jacob C. P. Wong J. Polym. Sci., Part A: Polym. Chem. 2002 40 1796
- (2002) J. Polym. Sci., Part A: Polym. Chem. , vol.40 , pp. 1796
- Li, H.¹ Wang, L.² Jacob, K.³ Wong, C.P.⁴

12
- 38049142817
- J. R. Mcelhanon E. M. Russick D. R. Wheeler D. A. Loy J. H. Aubert J. Appl. Polym. Sci. 2002 85 1496
- (2002) J. Appl. Polym. Sci. , vol.85 , pp. 1496
- McElhanon, J.R.¹ Russick, E.M.² Wheeler, D.R.³ Loy, D.A.⁴ Aubert, J.H.⁵

13
- 0037056318
- R. Gheneim C. Perez-Berumen A. Gandini Macromolecules 2002 35 7246
- (2002) Macromolecules , vol.35 , pp. 7246
- Gheneim, R.¹ Perez-Berumen, C.² Gandini, A.³

14
- 0036118136
- M. Shirai S. Morishita H. Okamura M. Tsunooka Chem. Mater. 2002 14 334
- (2002) Chem. Mater. , vol.14 , pp. 334
- Shirai, M.¹ Morishita, S.² Okamura, H.³ Tsunooka, M.⁴

15
- 0142152545
- M. Shirai A. Kawaue H. Okamura M. Tsunooka Chem. Mater. 2003 15 4075
- (2003) Chem. Mater. , vol.15 , pp. 4075
- Shirai, M.¹ Kawaue, A.² Okamura, H.³ Tsunooka, M.⁴

16
- 1242283904
- J.-S. Chen C. K. Ober M. D. Poliks Y. Zhang U. Wiesner C. Cohen Polymer 2004 45 1939
- (2004) Polymer , vol.45 , pp. 1939
- Chen, J.-S.¹ Ober, C.K.² Poliks, M.D.³ Zhang, Y.⁴ Wiesner, U.⁵ Cohen, C.⁶

17
- 4644260186
- M. Shirai A. Kawaue H. Okamura M. Tsunooka Polymer 2004 45 7519
- (2004) Polymer , vol.45 , pp. 7519
- Shirai, M.¹ Kawaue, A.² Okamura, H.³ Tsunooka, M.⁴

18
- 33745391342
- M. Watanabe N. Yoshie Polymer 2006 47 4946
- (2006) Polymer , vol.47 , pp. 4946
- Watanabe, M.¹ Yoshie, N.²

19
- 4043055831
- H. Okamura K. Shin M. Tsunooka M. Shirai J. Polym. Sci., Part A: Polym. Chem. 2004 42 3685
- (2004) J. Polym. Sci., Part A: Polym. Chem. , vol.42 , pp. 3685
- Okamura, H.¹ Shin, K.² Tsunooka, M.³ Shirai, M.⁴

20
- 4544247960
- Y.-D. Shin A. Kawaue H. Okamura M. Shirai Polym. Degrad. Stab. 2004 86 153
- (2004) Polym. Degrad. Stab. , vol.86 , pp. 153
- Shin, Y.-D.¹ Kawaue, A.² Okamura, H.³ Shirai, M.⁴

21
- 22144455355
- M. Shirai K. Mitsukura H. Okamura M. Miyasaka J. Photopolym. Sci. Technol. 2005 18 199
- (2005) J. Photopolym. Sci. Technol. , vol.18 , pp. 199
- Shirai, M.¹ Mitsukura, K.² Okamura, H.³ Miyasaka, M.⁴

22
- 33846889515
- H. Okamura K. Shin M. Shirai Polym. J. 2006 38 1237
- (2006) Polym. J. , vol.38 , pp. 1237
- Okamura, H.¹ Shin, K.² Shirai, M.³

23
- 33847074980
- M. Shirai Prog. Org. Coat. 2007 58 158
- (2007) Prog. Org. Coat. , vol.58 , pp. 158
- Shirai, M.¹

24
- 42449100478
- M. Shirai K. Mitsukura H. Okamura Chem. Mater. 2008 20 1971
- (2008) Chem. Mater. , vol.20 , pp. 1971
- Shirai, M.¹ Mitsukura, K.² Okamura, H.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.