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Volumn 62, Issue 12, 2010, Pages 90-93

Materials applications of photoelectron emission microscopy

(10) Xiong, G a,b Shao, R a,b Peppernick, S J a Joly, A G a Beck, K M a Hess, W P a Cai, M c,d Duchene, J e Wang, J Y e Wei, W D e

a PACIFIC NORTHWEST NATIONAL LABORATORY (United States)

b FIRST SOLAR (United States)

c WASHINGTON STATE UNIVERSITY (United States)

d Wyman Gordon Forgings (United States)

e University of Florida (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTRAST MECHANISM; ELECTRON PHOTOEMISSION; FAVORABLE CONDITIONS; IMAGE CONTRASTS; IMAGING STRUCTURE; MAGNETIC STATE; NANO SCALE; PHOTOELECTRON EMISSION MICROSCOPY; SPATIAL RESOLUTION; SPATIAL VARIATIONS; STATIC AND DYNAMIC;

ELECTRONIC PROPERTIES; NANOMAGNETICS; PHOTONS; SCANNING ELECTRON MICROSCOPY;

NANOSTRUCTURED MATERIALS;

EID: 78650921560 PISSN: 10474838 EISSN: 15431851 Source Type: Journal
DOI: 10.1007/s11837-010-0189-1 Document Type: Review

Times cited : (10)

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