UHV CAFM characterization of high-k dielectrics: Effect of the technique resolution on the pre- and post-breakdown electrical measurements

Microelectronics Reliability

Volumn 50, Issue 9-11, 2010, Pages 1312-1315

  Lanza, M ^a   Porti, M ^a   Nafria M ^a   Aymerich, X ^a   Whittaker, E ^b   Hamilton, B ^b  

^a UNIVERSITAT AUTÒNOMA DE BARCELONA   (Spain)

^b UNIVERSITY OF MANCHESTER   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTIVE ATOMIC FORCE MICROSCOPY; CONDUCTIVITY MEASUREMENTS; CONTACT MODES; CURRENT IMAGE; DRY NITROGEN; ELECTRICAL MEASUREMENT; ELECTRICAL PROPERTY; ENVIRONMENTAL CONDITIONS; HIGH-K DIELECTRIC; LATERAL PROPAGATION; LATERAL RESOLUTION; ULTRA-THIN;

ATOMIC FORCE MICROSCOPY;

ELECTRIC PROPERTIES;

EID: 78650876621     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.microrel.2010.07.049     Document Type: Conference Paper

References (19)

1. E. Efthymiou, S. Bernardini, S.N. Volkos, B. Hamilton, J.F. Zhang, and H.J. Uppal Microelectron Eng 84 2007 2290 2293
2. Y.L. Wu, S.T. Lin, and C.P. Lee IEEE Trans Dev Mater Rel 8 2 2008 352 357
3. P. Fiorenza, R. Lo Nigro, V. Raineri, S. Lombardo, R.G. Toro, and G. Malandrino Appl Phys Lett 87 23 2005 (Art. No. 231913)
4. M. Lanza, M. Porti, M. Nafria, X. Aymerich, G. Benstetter, and E. Lodermeier Microelectron Eng 86 7-9 2009 1921 1924
5. V. Yanev, M. Rommel, M. Lemberger, S. Petersen, B. Amon, and T. Erlbacher Appl Phys Lett 92 2008 1 10 (Art. No. 252910)
6. W. Polspoel, and W. Vandervorst Microelectron Eng 84 3 2007 495 500
7. M. Porti, M. Nafría, and X. Aymerich IEEE Trans Electron Dev 50 4 2003 933 940
8. S. Kremmer, S. Peissl, C. Teichert, F. Kuchar, H. Hofer, and S. Kremmer Mater Sci Eng B102 2003 88 93
9. J.N. Israelachvili Intermolecular and surface forces 1992 Academic Press London
10. M.A. Lantz, S.J. O'Shea, and M.E. Welland Rev Sci Instrum 69 4 1998 1757 1764
11. W. Frammelsberger, G. Benstetter, J. Kiely, and R. Stamp Appl Surf Sci 253 7 2007 3615 3626
12. T.G. Ruskell, R. Workman, D. Chen, D. Sarid, S. Dahl, and S. Gilbert Appl Phys Lett 68 1 2003 93 95
13. B. Cappella, and G. Dietler Surf Sci Rep 34 1999 1 104
14. X. Blasco, M. Nafria, and X. Aymerich Focus Nanotechnol Res 2004 95 112
15. D. Stievenard, and B. Legrand Prog Surf Sci 81 2-3 2006 112 140
16. J. Suñé, I. Placencia, N. Barniol, E. Farres, F. Martin, and X. Aymerich Thin Solid Films 185 2 1990 347 362
17. M. Porti, M. Nafría, X. Aymerich, A. Olbrich, and B. Ebersberger Appl Phys Lett 78 2001 4181 4183
18. L. Aguilera, M. Lanza, A. Bayerl, M. Porti, M. Nafria, and X. Aymerich J Vac Sci Technol B 27 1 2009 360 363
19. X. Blasco, M. Nafria, X. Aymerich, J. Petry, and W. Vandervorst IEEE Trans Electron Dev 52 12 2005 2817 2819