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Volumn 5, Issue , 2010, Pages 902-905

Hybrid low temperature wafer bonding and direct electrical interconnection of 3D MEMS

Author keywords

3D MEMS; AuSn eutectic bonding; Direct bonding; Hybrid wafer bonding; Vertical interconnect

Indexed keywords

BONDING; ELECTRIC POWER SYSTEM INTERCONNECTION; ELECTRONICS PACKAGING; EUTECTICS; HYBRID MATERIALS; INTEGRATED CIRCUIT INTERCONNECTS; INTEGRATION; LOW TEMPERATURE OPERATIONS; SILICON WAFERS; TEMPERATURE; THREE DIMENSIONAL INTEGRATED CIRCUITS; TIN ALLOYS;

EID: 78650613939     PISSN: None     EISSN: 18777058     Source Type: Conference Proceeding    
DOI: 10.1016/j.proeng.2010.09.255     Document Type: Conference Paper
Times cited : (5)

References (9)
  • 1
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    • Q.-Y. Tong and U. M. Gosele. Wafer bonding and layer splitting for microsystems. Advanced Materials 1999; 11; 1409-25.
    • (1999) Advanced Materials , vol.11 , pp. 1409-1425
    • Tong, Q.-Y.1    Gosele, U.M.2
  • 2
    • 14244258089 scopus 로고    scopus 로고
    • A CMOS-compatible high aspect ratio silicon-on-glass in-plane micro-accelerometer
    • J. Chae, H. Kulah, and K. Najafi. A CMOS-compatible high aspect ratio silicon-on-glass in-plane micro-accelerometer. J. Micromech. Microeng. 2005; 15; 336-45.
    • (2005) J. Micromech. Microeng. , vol.15 , pp. 336-345
    • Chae, J.1    Kulah, H.2    Najafi, K.3
  • 3
    • 47249096960 scopus 로고    scopus 로고
    • Wafer level packaging of MEMS
    • M. Esashi. Wafer level packaging of MEMS. J. Micromech. Microeng 2008; 18; 073001.
    • (2008) J. Micromech. Microeng , vol.18 , pp. 073001
    • Esashi, M.1
  • 5
    • 70549095282 scopus 로고    scopus 로고
    • Low Cost of Ownership scalable copper Direct Bond Interconnect 3D IC technology for three dimensional integrated circuit applications
    • P. Enquist, G. Fountain, C. Petteway, A. Hollingsworth, and H. Grady. Low Cost of Ownership scalable copper Direct Bond Interconnect 3D IC technology for three dimensional integrated circuit applications. In: 3D System Integration, 3DIC 2009; 1-6.
    • (2009) 3D System Integration, 3DIC , pp. 1-6
    • Enquist, P.1    Fountain, G.2    Petteway, C.3    Hollingsworth, A.4    Grady, H.5
  • 7
    • 0036607311 scopus 로고    scopus 로고
    • Effects of Plasma Activation on Hydrophilic Bonding of Si and SiO2
    • T. Suni, K. Henttinen, I. Suni, and J. Makinen. Effects of Plasma Activation on Hydrophilic Bonding of Si and SiO2. J. Electrochemical Soc. 2002; 149; G348-G351.
    • (2002) J. Electrochemical Soc. , vol.149
    • Suni, T.1    Henttinen, K.2    Suni, I.3    Makinen, J.4
  • 8
    • 65949112273 scopus 로고    scopus 로고
    • Low Temperature Fabrication Process for High-Aspect-Ratio and Multi-Compliant MEMS
    • S. Kuhne, R. Blattmann, and C. Hierold. Low Temperature Fabrication Process for High-Aspect-Ratio and Multi-Compliant MEMS. In: Micro Electro Mechanical Systems, MEMS 2009; 673-676.
    • (2009) Micro Electro Mechanical Systems, MEMS , pp. 673-676
    • Kuhne, S.1    Blattmann, R.2    Hierold, C.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.