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Journal of Vacuum Science and Technology B

Volumn 28, Issue 6, 2010, Pages

Nanofluidic channels fabricated by e-beam lithography and polymer reflow sealing

(3) Fouad, Mina a Yavuz, Mustafa a Cui, Bo a

a UNIVERSITY OF WATERLOO (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

CHAINS; ELECTRON BEAM LITHOGRAPHY; ESTERS; NANOFLUIDICS;

BI-LAYER; CHANNEL PATTERN; DOT PATTERNS; E-BEAM LITHOGRAPHY; E-BEAM RESIST; ELECTRON-BEAM LITHOGRAPHY; NANOFLUIDIC CHANNEL; POLY(METHYL METHACRYLATE); POLY-METHYL METHACRYLATES; THERMAL;

FABRICATION;

EID: 78650123788 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3517620 Document Type: Article

Times cited : (12)

References (13)

1
- 12844260686
- Micro- and nanofluidics for DNA analysis
- DOI 10.1007/s00216-004-2526-0
- J. O. Tegenfeldt, C. Prinz, H. Cao, R. L. Huang, R. H. Austin, S. Y. Chou, E. C. Cox, and J. C. Sturm, Anal. Bioanal. Chem. ABCNBP 1618-2642 378, 1678 (2004). 10.1007/s00216-004-2526-0 (Pubitemid 40877643)
- (2004) Analytical and Bioanalytical Chemistry , vol.378 , Issue.7 , pp. 1678-1692
- Tegenfeldt, J.O.¹ Prinz, C.² Cao, H.³ Huang, R.L.⁴ Austin, R.H.⁵ Chou, S.Y.⁶ Cox, E.C.⁷ Sturm, J.C.⁸

2
- 49449090221
- RMPHAT 0034-6861,. 10.1103/RevModPhys.80.839
- R. B. Schoch, J. Han, and P. Renaud, Rev. Mod. Phys. RMPHAT 0034-6861 80, 839 (2008). 10.1103/RevModPhys.80.839
- (2008) Rev. Mod. Phys. , vol.80 , pp. 839
- Schoch, R.B.¹ Han, J.² Renaud, P.³

3
- 18744363890
- Technologies for nanofluidic systems: Top-down vs. bottom-up - A review
- DOI 10.1039/b416951d
- D. Mijatovic, J. C. T. Eijkel, and A. van den Berg, Lab Chip LCAHAM 1473-0197 5, 492 (2005). 10.1039/b416951d (Pubitemid 40676814)
- (2005) Lab on a Chip - Miniaturisation for Chemistry and Biology , vol.5 , Issue.5 , pp. 492-500
- Mijatovic, D.¹ Eijkel, J.C.T.² Van Den Berg, A.³

4
- 41949085166
- JVTAD6 0734-2101,. 10.1116/1.581740
- J. Han and H. G. Craighead, J. Vac. Sci. Technol. A JVTAD6 0734-2101 17, 2142 (1999). 10.1116/1.581740
- (1999) J. Vac. Sci. Technol. A , vol.17 , pp. 2142
- Han, J.¹ Craighead, H.G.²

5
- 79958221815
- Fabrication of 10 nm enclosed nanofluidic channels
- DOI 10.1063/1.1489102
- H. Cao, Z. Yu, J. Wang, J. O. Tegenfeldt, R. H. Austin, E. Chen, W. Wu, and S. Y. Chou, Appl. Phys. Lett. APPLAB 0003-6951 81, 174 (2002). 10.1063/1.1489102 (Pubitemid 34783740)
- (2002) Applied Physics Letters , vol.81 , Issue.1 , pp. 174
- Cao, H.¹ Yu, Z.² Wang, J.³ Tegenfeldt, J.O.⁴ Austin, R.H.⁵ Chen, E.⁶ Wu, W.⁷ Chou, S.Y.⁸

6
- 33846439382
- Aligned horizontal silica nanochannels by oxidative self-sealing of patterned silicon wafers
- DOI 10.1021/cm062485h
- X. Chen, R. Ji, M. Steinhart, A. Milenin, K. Nielsch, and U. Gösele, Chem. Mater. CMATEX 0897-4756 19, 3 (2007). 10.1021/cm062485h (Pubitemid 46144463)
- (2007) Chemistry of Materials , vol.19 , Issue.1 , pp. 3-5
- Chen, X.¹ Ji, R.² Steinhart, M.³ Milenin, A.⁴ Nielsch, K.⁵ Gosele, U.⁶

7
- 58149308805
- NALEFD 1530-6984,. 10.1021/nl802219b
- Q. Xia, K. J. Morton, R. H. Austin, and S. Y. Chou, Nano Lett. NALEFD 1530-6984 8, 3830 (2008). 10.1021/nl802219b
- (2008) Nano Lett. , vol.8 , pp. 3830
- Xia, Q.¹ Morton, K.J.² Austin, R.H.³ Chou, S.Y.⁴

8
- 72849113887
- JVTBD9 1071-1023,. 10.1116/1.3264658
- N. R. Devlin, D. K. Brown, and P. A. Kohl, J. Vac. Sci. Technol. B JVTBD9 1071-1023 27, 2508 (2009). 10.1116/1.3264658
- (2009) J. Vac. Sci. Technol. B , vol.27 , pp. 2508
- Devlin, N.R.¹ Brown, D.K.² Kohl, P.A.³

9
- 17344388742
- MIENEF 0167-9317,. 10.1016/S0167-9317(04)00111-X
- Y. Chen, K. Peng, and Z. Cui, Microelectron. Eng. MIENEF 0167-9317 73-74, 278 (2004). 10.1016/S0167-9317(04)00111-X
- (2004) Microelectron. Eng. , vol.7374 , pp. 278
- Chen, Y.¹ Peng, K.² Cui, Z.³

10
- 0001603014
- JVTBD9 1071-1023,. 10.1116/1.588784
- H. Takano, H. Nakano, H. Minami, K. Hosogi, N. Yoshida, K. Sato, Y. Hirose, and N. Tsubouchi, J. Vac. Sci. Technol. B JVTBD9 1071-1023 14, 3483 (1996). 10.1116/1.588784
- (1996) J. Vac. Sci. Technol. B , vol.14 , pp. 3483
- Takano, H.¹ Nakano, H.² Minami, H.³ Hosogi, K.⁴ Yoshida, N.⁵ Sato, K.⁶ Hirose, Y.⁷ Tsubouchi, N.⁸

11
- 33845254358
- Robust shadow-mask evaporation via lithographically controlled undercut
- DOI 10.1116/1.2375090
- B. Cord, C. Dames, K. K. Berggren, and J. Aumentado, J. Vac. Sci. Technol. B JVTBD9 1071-1023 24, 3139 (2006). 10.1116/1.2375090 (Pubitemid 44866483)
- (2006) Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures , vol.24 , Issue.6 , pp. 3139-3143
- Cord, B.¹ Dames, C.² Berggren, K.K.³ Aumentado, J.⁴

12
- 44149084033
- MIENEF 0167-9317,. 10.1016/j.mee.2008.01.008
- B. Cui and T. Veres, Microelectron. Eng. MIENEF 0167-9317 85, 810 (2008). 10.1016/j.mee.2008.01.008
- (2008) Microelectron. Eng. , vol.85 , pp. 810
- Cui, B.¹ Veres, T.²

13
- 77950516640
- ZZZZZZ 1931-7573,. 10.1007/s11671-010-9540-2
- S. M. Saydur Rahman and B. Cui, Nanoscale Res. Lett. ZZZZZZ 1931-7573 5, 545 (2010). 10.1007/s11671-010-9540-2
- (2010) Nanoscale Res. Lett. , vol.5 , pp. 545
- Saydur Rahman, S.M.¹ Cui, B.²

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