Robust shadow-mask evaporation via lithographically controlled undercut

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 6, 2006, Pages 3139-3143

  Cord, B ^a   Dames, C ^a   Berggren, K K ^a   Aumentado, J ^b  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING LAYERS; MASK EVAPORATION;

COMPUTATION THEORY; ELECTRON BEAM LITHOGRAPHY; JOSEPHSON JUNCTION DEVICES; MASKS; ROBUSTNESS (CONTROL SYSTEMS); SUSPENSIONS (FLUIDS);

EVAPORATION;

EID: 33845254358     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2375090     Document Type: Article

References (7)

1. G. J. Dolan, Appl. Phys. Lett. 31, 337 (1977).
2. H. Scherer, A. B. Zorin, and J. Niemeyer, J. Appl. Phys. 97, 54501 (2005).
3. D. Berman, Ph.D Thesis, Massachusetts Institute of Technology, 1998.
4. Y. Chen, K. Peng, and Z. Cui, Microelectron. Eng. 73-74, 278 (2004).
5. P. Hovington, D. Drouin, and R. Gauvin, Scanning 19, 1 (1997).
6. R. J. Hawryluk, J. Vac. Sci. Technol. 19, 1 (1981).
7. E. H. Anderson, D. L. Olynick, W. Chao, and B. Harteneck, J. Vac. Sci. Technol. B 19, 2504 (2001).