Understanding adhesion at as-deposited interfaces from ab initio thermodynamics of deposition growth: Thin-film alumina on titanium carbide

Journal of Physics Condensed Matter

Volumn 22, Issue 47, 2010, Pages

  Rohrer, Jochen ^a   Hyldgaard, Per ^a  

^a CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

AB INITIO THERMODYNAMICS; AS-DEPOSITED THIN FILMS; BINARY MATERIALS; BURIED INTERFACE; CHEMICAL COMPOSITIONS; CHEMICAL VAPOURS; DENSITY FUNCTIONAL THEORY CALCULATIONS; EQUILIBRIUM THEORY; EQUILIBRIUM THERMODYNAMICS; INDUSTRIAL USE; NON EQUILIBRIUM; PRESSURE EVOLUTION; RATE EQUATIONS; SURFACE AND INTERFACES; THERMOCHEMICAL DATA; WEAR-RESISTANT COATING;

ADHESION; DENSITY FUNCTIONAL THEORY; DEPOSITION; GALERKIN METHODS; INDUSTRIAL APPLICATIONS; THERMODYNAMICS; TITANIUM; TITANIUM CARBIDE;

FILM GROWTH;

ALUMINUM OXIDE; TITANIUM; TITANIUM CARBIDE;

ADHESION; ARTICLE; ARTIFICIAL MEMBRANE; CHEMICAL MODEL; CHEMISTRY; COMPUTER SIMULATION; SURFACE PROPERTY; THERMODYNAMICS;

ADHESIVENESS; ALUMINUM OXIDE; COMPUTER SIMULATION; MEMBRANES, ARTIFICIAL; MODELS, CHEMICAL; SURFACE PROPERTIES; THERMODYNAMICS; TITANIUM;

EID: 78649891025     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/22/47/472001     Document Type: Article

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