Abinitio structure modelling of complex thin-film oxides: Thermodynamical stability of TiC/thin-film alumina

Journal of Physics Condensed Matter

Volumn 22, Issue 1, 2010, Pages

  Rohrer, J ^a   Ruberto, C ^a   Hyldgaard, P ^a  

^a CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

A-STABILITY; AB INITIO; ATOMIC GEOMETRY; BULK PHASIS; CHEMICAL VAPOUR DEPOSITION; METASTABLE OXIDES; MULTI-LAYER-COATING; NO BINDING; OXIDE STRUCTURES; STOICHIOMETRIC COMPOSITIONS; STRUCTURE MODELLING; SUB-LATTICES; THIN-FILM GEOMETRY; WEAR-RESISTANT;

ALUMINA; CHEMICAL RESISTANT MATERIALS; METASTABLE PHASES; PHASE INTERFACES; THERMODYNAMICS; THIN FILM DEVICES; TITANIUM CARBIDE;

CHEMICAL VAPOR DEPOSITION;

ALUMINUM OXIDE; OXIDE; TITANIUM; TITANIUM CARBIDE;

ARTICLE; CHEMICAL PHENOMENA; CHEMICAL STRUCTURE; CHEMISTRY; CONFORMATION; QUANTUM THEORY; THERMODYNAMICS;

ALUMINUM OXIDE; HYDROPHOBIC AND HYDROPHILIC INTERACTIONS; MODELS, MOLECULAR; MOLECULAR CONFORMATION; OXIDES; QUANTUM THEORY; THERMODYNAMICS; TITANIUM;

EID: 72249110896     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/22/1/015004     Document Type: Article

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