High efficiency multilayer blazed gratings for EUV and soft x-rays: Recent developments

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7802, Issue , 2010, Pages

  Voronov, Dmitriy L ^a   Ahn, Minseung ^b   Anderson, Erik H ^a   Cambie, Rossana ^a   Chang, Chih Hao ^b   Goray, Leonid I ^c,d   Gullikson, Eric M ^a   Heilmann, Ralf K ^b   Salmassi, Farhad ^a   Schattenburg, Mark L ^b   Warwick, Tony ^a   Yashchuk, Valeriy V ^a   Padmore, Howard A ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^c ST PETERSBURG ACADEMIC UNIVERSITY   (Russian Federation)

^d INSTITUTE FOR ANALYTICAL INSTRUMENTATION   (Russian Federation)

Author keywords

Blazed grating; Diffraction efficiency; Diffraction grating; EUV; Multilayer coating; Scanning beam interference lithography; Soft x rays; TEM; Wet anisotropic etch

Indexed keywords

ANISOTROPIC ETCH; BLAZED GRATING; EUV; MULTILAYER COATING; SCANNING BEAM INTERFERENCE LITHOGRAPHY; SOFT X-RAY; TEM;

ANISOTROPY; ATOMIC FORCE MICROSCOPY; COATINGS; DIFFRACTION EFFICIENCY; DIFFRACTION GRATINGS; FABRICATION; LIGHT SOURCES; LITHOGRAPHY; SCANNING; SUN; TRANSMISSION ELECTRON MICROSCOPY; X RAY LITHOGRAPHY; X RAY SPECTROSCOPY; X RAYS;

MULTILAYERS;

EID: 78649817912     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.861287     Document Type: Conference Paper

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