-
1
-
-
26244451229
-
-
RMPHAT 0034-6861,. 10.1103/RevModPhys.77.489
-
K. Ostrikov, Rev. Mod. Phys. RMPHAT 0034-6861 77, 489 (2005). 10.1103/RevModPhys.77.489
-
(2005)
Rev. Mod. Phys.
, vol.77
, pp. 489
-
-
Ostrikov, K.1
-
2
-
-
20144369634
-
-
NMAACR 1476-1122,. 10.1038/nmat1387
-
M. Law, L. E. Greene, J. C. Johnson, R. Saykally, and P. Yang, Nature Mater. NMAACR 1476-1122 4, 455 (2005). 10.1038/nmat1387
-
(2005)
Nature Mater.
, vol.4
, pp. 455
-
-
Law, M.1
Greene, L.E.2
Johnson, J.C.3
Saykally, R.4
Yang, P.5
-
3
-
-
77950271975
-
-
CVDEFX 0948-1907,. 10.1002/cvde.200906801
-
Y. K. Byeun, R. Telle, S. H. Jung, S. C. Choi, and H. I. Hwang, Chem. Vap. Deposition CVDEFX 0948-1907 16, 72 (2010). 10.1002/cvde.200906801
-
(2010)
Chem. Vap. Deposition
, vol.16
, pp. 72
-
-
Byeun, Y.K.1
Telle, R.2
Jung, S.H.3
Choi, S.C.4
Hwang, H.I.5
-
4
-
-
42549141803
-
-
ANCAC3 1936-0851,. 10.1021/nn700363t
-
J. Zheng, Y. Yang, B. Yu, X. Song, and X. Li, ACS Nano ANCAC3 1936-0851 2, 134 (2008). 10.1021/nn700363t
-
(2008)
ACS Nano
, vol.2
, pp. 134
-
-
Zheng, J.1
Yang, Y.2
Yu, B.3
Song, X.4
Li, X.5
-
5
-
-
4444240162
-
-
INMREO 0950-6608,. 10.1179/095066004225021891
-
N. M. Hwang and D. Y. Kim, Int. Mater. Rev. INMREO 0950-6608 49, 171 (2004). 10.1179/095066004225021891
-
(2004)
Int. Mater. Rev.
, vol.49
, pp. 171
-
-
Hwang, N.M.1
Kim, D.Y.2
-
6
-
-
0032495951
-
-
CHPLBC 0009-2614,. 10.1016/S0009-2614(98)00227-9
-
S. Xu, H. S. Li, Y. A. Li, S. Lee, and C. H. A. Huan, Chem. Phys. Lett. CHPLBC 0009-2614 287, 731 (1998). 10.1016/S0009-2614(98)00227-9
-
(1998)
Chem. Phys. Lett.
, vol.287
, pp. 731
-
-
Xu, S.1
Li, H.S.2
Li, Y.A.3
Lee, S.4
Huan, C.H.A.5
-
7
-
-
33847751555
-
-
JAPIAU 0021-8979,. 10.1063/1.2423224
-
C. Mirpuri, S. Xu, J. D. Long, and K. Ostrikov, J. Appl. Phys. JAPIAU 0021-8979 101, 024312 (2007). 10.1063/1.2423224
-
(2007)
J. Appl. Phys.
, vol.101
, pp. 024312
-
-
Mirpuri, C.1
Xu, S.2
Long, J.D.3
Ostrikov, K.4
-
8
-
-
28844462386
-
-
APPLAB 0003-6951,. 10.1063/1.2140888
-
V. Ligatchev, Rusli, and Z. Pan, Appl. Phys. Lett. APPLAB 0003-6951 87, 242903 (2005). 10.1063/1.2140888
-
(2005)
Appl. Phys. Lett.
, vol.87
, pp. 242903
-
-
Ligatchev, V.1
Rusli2
Pan, Z.3
-
9
-
-
67649150414
-
-
NANOFJ 1793-2920,. 10.1142/S1793292007000763
-
Y. B. Tang, H. T. Cong, and H. M. Cheng, NANO NANOFJ 1793-2920 2, 307 (2007). 10.1142/S1793292007000763
-
(2007)
NANO
, vol.2
, pp. 307
-
-
Tang, Y.B.1
Cong, H.T.2
Cheng, H.M.3
-
10
-
-
71949103923
-
-
APPLAB 0003-6951,. 10.1063/1.3271774
-
X. H. Ji, Q. Y. Zhang, Z. Y. Ling, and S. P. Lau, Appl. Phys. Lett. APPLAB 0003-6951 95, 233105 (2009). 10.1063/1.3271774
-
(2009)
Appl. Phys. Lett.
, vol.95
, pp. 233105
-
-
Ji, X.H.1
Zhang, Q.Y.2
Ling, Z.Y.3
Lau, S.P.4
-
11
-
-
56349133572
-
-
APAMFC 0947-8396,. 10.1007/s00339-008-4722-9
-
H. Q. Bao, X. L. Chen, H. Li, G. Wang, B. Song, and W. J. Wang, Appl. Phys. A: Mater. Sci. Process. APAMFC 0947-8396 94, 173 (2009). 10.1007/s00339-008-4722-9
-
(2009)
Appl. Phys. A: Mater. Sci. Process.
, vol.94
, pp. 173
-
-
Bao, H.Q.1
Chen, X.L.2
Li, H.3
Wang, G.4
Song, B.5
Wang, W.J.6
-
12
-
-
67650070783
-
-
ADVMEW 0935-9648,. 10.1002/adma.200803754
-
V. Schmidt, J. V. Wittemann, S. Senz, and U. Gösele, Adv. Mater. (Weinheim, Ger.) ADVMEW 0935-9648 21, 2681 (2009). 10.1002/adma.200803754
-
(2009)
Adv. Mater. (Weinheim, Ger.)
, vol.21
, pp. 2681
-
-
Schmidt, V.1
Wittemann, J.V.2
Senz, S.3
Gösele, U.4
-
13
-
-
70349506167
-
-
APPLAB 0003-6951,. 10.1063/1.3232238
-
F. Y. Ran, M. Subramanian, M. Tanemura, Y. Hayashi, and T. Hihara, Appl. Phys. Lett. APPLAB 0003-6951 95, 112111 (2009). 10.1063/1.3232238
-
(2009)
Appl. Phys. Lett.
, vol.95
, pp. 112111
-
-
Ran, F.Y.1
Subramanian, M.2
Tanemura, M.3
Hayashi, Y.4
Hihara, T.5
-
14
-
-
32844460931
-
-
VACUAV 0042-207X,. 10.1016/j.vacuum.2005.07.010
-
S. Xu, K. Ostrikov, J. D. Long, and S. Y. Huang, Vacuum VACUAV 0042-207X 80, 621 (2006). 10.1016/j.vacuum.2005.07.010
-
(2006)
Vacuum
, vol.80
, pp. 621
-
-
Xu, S.1
Ostrikov, K.2
Long, J.D.3
Huang, S.Y.4
-
15
-
-
34248545539
-
-
APPLAB 0003-6951,. 10.1063/1.2731728
-
Q. J. Cheng, S. Xu, J. D. Long, and K. Ostrikov, Appl. Phys. Lett. APPLAB 0003-6951 90, 173112 (2007). 10.1063/1.2731728
-
(2007)
Appl. Phys. Lett.
, vol.90
, pp. 173112
-
-
Cheng, Q.J.1
Xu, S.2
Long, J.D.3
Ostrikov, K.4
-
16
-
-
56949089545
-
-
CRBNAH 0008-6223,. 10.1016/j.carbon.2008.10.005
-
I. Levchenko, K. Ostrikov, and D. Mariotti, Carbon CRBNAH 0008-6223 47, 344 (2009). 10.1016/j.carbon.2008.10.005
-
(2009)
Carbon
, vol.47
, pp. 344
-
-
Levchenko, I.1
Ostrikov, K.2
Mariotti, D.3
-
17
-
-
34248570861
-
-
JPAPBE 0022-3727,. 10.1088/0022-3727/40/8/S01
-
K. Ostrikov and A. B. Murphy, J. Phys. D: Appl. Phys. JPAPBE 0022-3727 40, 2223 (2007). 10.1088/0022-3727/40/8/S01
-
(2007)
J. Phys. D: Appl. Phys.
, vol.40
, pp. 2223
-
-
Ostrikov, K.1
Murphy, A.B.2
-
18
-
-
33744545041
-
-
NNOTER 0957-4484,. 10.1088/0957-4484/17/11/S15
-
J. Yang, T. W. Liu, C. W. Hsu, L. C. Chen, K. H. Chen, and C. C. Chen, Nanotechnology NNOTER 0957-4484 17, S321 (2006). 10.1088/0957-4484/17/11/S15
-
(2006)
Nanotechnology
, vol.17
, pp. 321
-
-
Yang, J.1
Liu, T.W.2
Hsu, C.W.3
Chen, L.C.4
Chen, K.H.5
Chen, C.C.6
-
19
-
-
58049111861
-
-
PRMSAQ 0079-6425,. 10.1016/j.pmatsci.2008.08.001
-
C. Q. Sun, Prog. Mater. Sci. PRMSAQ 0079-6425 54, 179 (2009). 10.1016/j.pmatsci.2008.08.001
-
(2009)
Prog. Mater. Sci.
, vol.54
, pp. 179
-
-
Sun, C.Q.1
-
21
-
-
77956683170
-
-
JALCEU 0925-8388,. 10.1016/j.jallcom.2010.05.021
-
H. Li, W. J. Wang, B. Song, R. Wu, J. Li, Y. F. Sun, Y. F. Zheng, and J. K. Jian, J. Alloys Compd. JALCEU 0925-8388 503, L34 (2010). 10.1016/j.jallcom. 2010.05.021
-
(2010)
J. Alloys Compd.
, vol.503
, pp. 34
-
-
Li, H.1
Wang, W.J.2
Song, B.3
Wu, R.4
Li, J.5
Sun, Y.F.6
Zheng, Y.F.7
Jian, J.K.8
-
22
-
-
0036164589
-
-
JVTAD6 0734-2101,. 10.1116/1.1430426
-
K. N. Ostrikov, S. Xu, and A. B. M. S. Azam, J. Vac. Sci. Technol. A JVTAD6 0734-2101 20, 251 (2002). 10.1116/1.1430426
-
(2002)
J. Vac. Sci. Technol. A
, vol.20
, pp. 251
-
-
Ostrikov, K.N.1
Xu, S.2
Azam, A.B.M.S.3
-
23
-
-
66849121533
-
-
CGDEFU 1528-7483,. 10.1021/cg900176c
-
Q. J. Cheng, S. Xu, S. Y. Huang, and K. Ostrikov, Cryst. Growth Des. CGDEFU 1528-7483 9, 2863 (2009). 10.1021/cg900176c
-
(2009)
Cryst. Growth Des.
, vol.9
, pp. 2863
-
-
Cheng, Q.J.1
Xu, S.2
Huang, S.Y.3
Ostrikov, K.4
-
24
-
-
77954591449
-
-
JMACEP 0959-9428,. 10.1039/c0jm01060j
-
Q. J. Cheng, S. Xu, and K. Ostrikov, J. Mater. Chem. JMACEP 0959-9428 20, 5853 (2010). 10.1039/c0jm01060j
-
(2010)
J. Mater. Chem.
, vol.20
, pp. 5853
-
-
Cheng, Q.J.1
Xu, S.2
Ostrikov, K.3
-
25
-
-
33845939049
-
-
APPLAB 0003-6951,. 10.1063/1.2408662
-
M. Xu, S. Xu, J. W. Chai, J. D. Long, and Y. C. Ee, Appl. Phys. Lett. APPLAB 0003-6951 89, 251904 (2006). 10.1063/1.2408662
-
(2006)
Appl. Phys. Lett.
, vol.89
, pp. 251904
-
-
Xu, M.1
Xu, S.2
Chai, J.W.3
Long, J.D.4
Ee, Y.C.5
-
26
-
-
41649109023
-
-
APPLAB 0003-6951,. 10.1063/1.2905265
-
U. Cvelbar, K. Ostrikov, A. Drenik, and M. Mozetič, Appl. Phys. Lett. APPLAB 0003-6951 92, 133505 (2008). 10.1063/1.2905265
-
(2008)
Appl. Phys. Lett.
, vol.92
, pp. 133505
-
-
Cvelbar, U.1
Ostrikov, K.2
Drenik, A.3
Mozetič, M.4
-
27
-
-
55349092356
-
-
SMALBC 1613-6810,. 10.1002/smll.200800278
-
U. Cvelbar, Z. Q. Chen, M. K. Sunakra, and M. Mozetic, Small SMALBC 1613-6810 4, 1610 (2008). 10.1002/smll.200800278
-
(2008)
Small
, vol.4
, pp. 1610
-
-
Cvelbar, U.1
Chen, Z.Q.2
Sunakra, M.K.3
Mozetic, M.4
-
28
-
-
24644507954
-
-
ADVMEW 0935-9648,. 10.1002/adma.200500728
-
M. Mozetičs, U. Cvelbar, M. K. Sunakra, and S. Vaddiraju, Adv. Mater. (Weinheim, Ger.) ADVMEW 0935-9648 17, 2138 (2005). 10.1002/adma.200500728
-
(2005)
Adv. Mater. (Weinheim, Ger.)
, vol.17
, pp. 2138
-
-
Mozetič, M.1
Cvelbar, U.2
Sunakra, M.K.3
Vaddiraju, S.4
-
29
-
-
67649194469
-
-
NNOTER 0957-4484,. 10.1088/0957-4484/20/21/215606
-
Q. J. Cheng, S. Xu, and K. Ostrikov, Nanotechnology NNOTER 0957-4484 20, 215606 (2009). 10.1088/0957-4484/20/21/215606
-
(2009)
Nanotechnology
, vol.20
, pp. 215606
-
-
Cheng, Q.J.1
Xu, S.2
Ostrikov, K.3
-
30
-
-
54049103610
-
-
JAPIAU 0021-8979,. 10.1063/1.2986915
-
I. Denysenko, K. Ostrikov, U. Cvelbar, M. Mozetic, and N. A. Azarenkov, J. Appl. Phys. JAPIAU 0021-8979 104, 073301 (2008). 10.1063/1.2986915
-
(2008)
J. Appl. Phys.
, vol.104
, pp. 073301
-
-
Denysenko, I.1
Ostrikov, K.2
Cvelbar, U.3
Mozetic, M.4
Azarenkov, N.A.5
-
31
-
-
77049100568
-
-
ADVMEW 0935-9648,. 10.1002/adma.200901864
-
J. Shieh, F. J. Hou, Y. C. Chen, H. M. Chen, S. P. Yang, C. C. Cheng, and H. L. Chen, Adv. Mater. ADVMEW 0935-9648 22, 597 (2010). 10.1002/adma.200901864
-
(2010)
Adv. Mater.
, vol.22
, pp. 597
-
-
Shieh, J.1
Hou, F.J.2
Chen, Y.C.3
Chen, H.M.4
Yang, S.P.5
Cheng, C.C.6
Chen, H.L.7
-
32
-
-
77957911045
-
-
10.1039/c0nr00366b
-
K. Ostrikov, I. Levchenko, U. Cvelbar, M. Sunkara, and M. Mozetic, Nanoscale 2, 2012 (2010). 10.1039/c0nr00366b
-
(2010)
Nanoscale
, vol.2
, pp. 2012
-
-
Ostrikov, K.1
Levchenko, I.2
Cvelbar, U.3
Sunkara, M.4
Mozetic, M.5
-
33
-
-
77950793234
-
-
ADVMEW 0935-9648,. 10.1002/adma.200903147
-
J. Zheng, R. Yang, L. Xie, J. Qu, Y. Liu, and X. Li, Adv. Mater. (Weinheim, Ger.) ADVMEW 0935-9648 22, 1451 (2010). 10.1002/adma.200903147
-
(2010)
Adv. Mater. (Weinheim, Ger.)
, vol.22
, pp. 1451
-
-
Zheng, J.1
Yang, R.2
Xie, L.3
Qu, J.4
Liu, Y.5
Li, X.6
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