Fundamental mechanisms of focused ion beam guided anodization

Journal of Applied Physics

Volumn 108, Issue 9, 2010, Pages

  Tian, Zhipeng ^a   Lu, Kathy ^a   Chen, Bo ^a  

^a Virginia Polytechnic Institute and State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIZATIONS; BARRIER LAYER THICKNESS; DIFFERENT SIZES; ELECTRICAL FIELD; INTERPORE DISTANCES; ION BEAM PATTERNING; MECHANICAL STRESS; NON-SPHERICAL; PORE FORMATION; PORE SHAPE;

BEAM PLASMA INTERACTIONS; ION BOMBARDMENT; IONS; PORE SIZE; STRESSES;

FOCUSED ION BEAMS;

EID: 78649267922     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3500513     Document Type: Article

References (36)

1. M. A. Kashi, A. Ramazani, M. Rahmandoust, and M. Noormohammadi, J. Phys. D JPAPBE 0022-3727 40, 4625 (2007). 10.1088/0022-3727/40/15/040 (Pubitemid 47160496)
2. S. Ono, M. Saito, M. Ishiguro, and H. Asoh, J. Electrochem. Soc. JESOAN 0013-4651 151, B473 (2004). 10.1149/1.1767838
3. M. T. Wu, I. C. Leu, and M. H. Hon, J. Vac. Sci. Technol. B JVTBD9 1071-1023 22, 2326 (2004). 10.1116/1.1783320
4. Z. X. Su, G. Hahner, and W. Z. Zhou, J. Mater. Chem. JMACEP 0959-9428 18, 5787 (2008). 10.1039/b812432a
5. V. V. Yuzhakov, H. C. Chang, and A. E. Miller, Phys. Rev. B PLRBAQ 0556-2805 56, 12608 (1997). 10.1103/PhysRevB.56.12608
6. M. T. Wu, I. C. Leu, and M. H. Hon, J. Vac. Sci. Technol. B JVTBD9 1071-1023 20, 776 (2002). 10.1116/1.1467657 (Pubitemid 34751253)
7. M. Jaafar, D. Navas, M. Hemandel-Vezez, J. L. Baldonedo, M. Vezquez, and A. Asenjo, Surf. Sci. SUSCAS 0039-6028 603, 3155 (2009). 10.1016/j.susc.2009.09. 002
8. H. Asoh, K. Nishio, M. Nakao, T. Tamamura, and H. Masuda, J. Electrochem. Soc. JESOAN 0013-4651 148, B152 (2001). 10.1149/1.1355686 (Pubitemid 33693431)
9. H. Asoh, K. Nishio, M. Nakao, A. Yokoo, T. Tamamura, and H. Masuda, J. Vac. Sci. Technol. B JVTBD9 1071-1023 19, 569 (2001). 10.1116/1.1347039 (Pubitemid 32435290)
10. J. Choi, S. Guido, N. Kornelius, B. W. Ralf, and U. Gosele, Chem. Mater. CMATEX 0897-4756 15, 776 (2003). 10.1021/cm0208758
11. H. Masuda, M. Yotsuya, M. Asano, and K. Nishio, Appl. Phys. Lett. APPLAB 0003-6951 78, 826 (2001). 10.1063/1.1344575 (Pubitemid 33630363)
12. J. Choi, R. B. Wehrspohn, and U. Gosele, Electrochim. Acta ELCAAV 0013-4686 50, 2591 (2005). 10.1016/j.electacta.2004.11.004 (Pubitemid 40467120)
13. Z. J. Sun and H. K. Kim, Appl. Phys. Lett. APPLAB 0003-6951 81, 3458 (2002). 10.1063/1.1517719 (Pubitemid 35360494)
14. N. W. Liu, A. Datta, C. Y. Liu, and Y. L. Wang, Appl. Phys. Lett. APPLAB 0003-6951 82, 1281 (2003). 10.1063/1.1555689
15. C. Y. Peng, C. Y. Liu, N. W. Liu, H. H. Wang, A. Datta, and Y. L. Wang, J. Vac. Sci. Technol. B JVTBD9 1071-1023 23, 559 (2005). 10.1116/1.1884123 (Pubitemid 43126463)
16. C. Y. Liu, A. Datta, and Y. L. Wang, Appl. Phys. Lett. APPLAB 0003-6951 78, 120 (2001). 10.1063/1.1335543 (Pubitemid 33661777)
17. K. Lu, J. Nanosci. Nanotechnol. JNNOAR 1533-4880 9, 2598 (2009). 10.1166/jnn.2009.dk17
18. K. Lu and J. Z. Zhao, J. Nanosci. Nanotechnol. JNNOAR 1533-4880 10, 6760 (2010). 10.1166/jnn.2010.2641
19. J. Zhao, K. Lu, B. Chen, and Z. Tian, Ceram. Trans. CETREW 1042-1122 223, 47 (2010).
20. H. Asoh, S. Ono, T. Hirose, I. Takatori, and H. Masuda, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 43, 6342 (2004). 10.1143/JJAP.43.6342
21. H. Asoh, S. Ono, T. Hirose, M. Nakao, and H. Masuda, Electrochim. Acta ELCAAV 0013-4686 48, 3171 (2003). 10.1016/S0013-4686(03)00347-5
22. O. Jessensky, F. Muller, and U. Gosele, Appl. Phys. Lett. APPLAB 0003-6951 72, 1173 (1998). 10.1063/1.121004 (Pubitemid 128677832)
23. G. E. Thompson and G. C. Wood, Nature (London) NATUAS 0028-0836 290, 230 (1981). 10.1038/290230a0
24. J. Choi, Y. Luo, R. B. Wehrspohn, R. Hillebrand, J. Schilling, and U. Gosele, J. Appl. Phys. JAPIAU 0021-8979 94, 4757 (2003). 10.1063/1.1609033
25. T. P. Hoar and N. F. Mott, J. Phys. Chem. Solids JPCSAW 0022-3697 9, 97 (1959). 10.1016/0022-3697(59)90199-4
26. J. P. O'Sulliva and G. C. Wood, Proc. R. Soc. London PRSLAZ 0370-1662 317, 511 (1970). 10.1098/rspa.1970.0129
27. V. P. Parkhutik and V. I. Shershulsky, J. Phys. D JPAPBE 0022-3727 25, 1258 (1992). 10.1088/0022-3727/25/8/017
28. S. K. Thamida and H. C. Chang, Chaos CHAOEH 1054-1500 12, 240 (2002). 10.1063/1.1436499
29. A. I. Vorobyova, E. A. Outkina, and A. A. Khodin, Russ. Microelectron. 36, 384 (2007). 10.1134/S1063739707060054 1063-7397 (Pubitemid 350172419)
30. R. M. Saleh and A. A. El Hosary, J. Therm. Anal. JTHEA9 0368-4466 26, 263 (1983). 10.1007/BF01913211
31. D. R. Lide, CRC Handbook of Chemistry and Physics (CRC, Boston, 1992), pp. 12-119.
32. S. J. Schneider, Ceramics and Glasses, Engineered Materials Handbook Vol. 4 (ASM International, Cleveland, OH, 1991), p. 30.
33. H. Takahashi, K. Fujimoto, H. Konno, and M. Magayama, J. Electrochem. Soc. JESOAN 0013-4651 131, 1856 (1984). 10.1149/1.2115978
34. L. A. Giannuzzi and F. A. Stevie, Introduction to Focused Ion Beams: Instrumentation, Theory, Techniques and Practice (Springer, New York, 2005). 10.1007/b101190
35. J. M. Woodall, Making of hydrogen from aluminum, 2007. http://hydrogen.ecn.purdue.edu/
36. Z. Tian, K. Lu, and B. Chen, Nanotechnology NNOTER 0957-4484 21, 405301 (2010). 10.1088/0957-4484/21/40/405301