Hexagonally arranged monodisperse silver nanowires with adjustable diameter and high aspect ratio

Chemistry of Materials

Volumn 15, Issue 3, 2003, Pages 776-779

  Choi, Jinsub ^a   Sauer, Guido ^b   Nielsch, Kornelius ^a   Wehrspohn, Ralf B ^a   Gösele, Ulrich ^a  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^b UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; SILVER;

ARTICLE; CRYSTAL STRUCTURE; DIELECTRIC CONSTANT; DRY DEPOSITION; ELECTROCHEMICAL ANALYSIS; ELECTROPLATING INDUSTRY; NANOPARTICLE;

EID: 0037431971     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm0208758     Document Type: Article

References (22)

1. Wehrspohn, R. B.; Schilling, J. Mater. Res. Bull. 2001, 8, 623.
2. Masuda, H.; Yamada, H.; Satoh, M.; Asoh, H.; Nakao, M.; Tamamura, T. Appl. Phys. Lett. 1997, 71, 2770.
3. Choi, J.; Nielsch, K.; Reiche, M.; Wehrspohn, R. B.; Gösele, U. J. Vac. Sci. Technol. B, accepted, 2003, March/April, in press.
4. Asoh, H.; Nishio, K.; Nakao, M.; Tamamura, T.; Masuda, H. J. Electrochem. Soc. 2001, 148, B152.
5. Masuda, H.; Ohya, M.; Asoh, H.; Nakao, M.; Nohtomi, M.; Tamamura, T. Jpn. J. Appl. Phys. 1999, 38, L1403.
6. Choi, J.; Schilling, J.; Nielsch, K.; Hillebrand, R.; Reiche, M.; Wehrspohn, R. B.; Gösele, U. Mater. Res. Soc. Symp. Proc. 2002, 722, L5.2.
7. Sauer, G.; Brehm, G.; Schneider, S.; Nielsch, K.; Wehrspohn, R. B.; Choi, J.; Hofmeister, H.; Gösele, U. J. Appl. Phys. 2002, 91, 3243.
8. Walsh, R. J.; Chumanov, G. Appl. Spectrosc. 2001, 55, 1695.
9. Yanson, A. I.; Bollinger, G. R.; van den Brom, H. E.; Agrait, N.; van Ruitenbeek, J. M. Nature 1998, 395, 783.
10. Malicka, J.; Gryczynski, I.; Kusba, J.; Shen, Y. B.; Lakowicz, J. R. Biochem. Biophys. Res. Commun. 2002, 294, 886.
11. van der Lem, H.; Moroz, A. J. Opt. A: Pure Appl. Opt. 2000, 2, 395.
12. Sauer, G.; Choi, J. Unpublished results.
13. Nielsch, K.; Choi, J.; Schwirn, K.; Wehrspohn, R. B.; Gösele, U. Nano Lett. 2002, 2, 677.
14. Keller, F.; Hunter, M. S.; Robinson, D. L. J. Electrochem. Soc. 1953, 100, 411.
15. Nielsch, K.; Müller, F.; Li, A.-P.; Gösele, U. Adv. Mater. 2000, 12, 582.
16. Choi, J.; Nielsch, K.; Wehrspohn, R. B.; Gösele, U. Unpublished results.
17. 2, respectively.
18. Jiang, X. C.; Xie, Y.; Zhu, L. Y.; Qian, Y. T. J. Mater. Chem. 2001, 7, 1775.
19. Cepak, V. M.; Martin, C. R. J. Phys. Chem. B 1998, 102, 9985.
20. Wehrspohn, R. B.; Li, A. P.; Nielsch, K.; Müller, F.; Erfurth, W.; Gösele, U. In Oxide Films; Hebert, K. R., Lillard, R. S., MacDougall, B. R., Eds.; Electrochemical Society: Pennington, NJ, 2000; PV-2000-4, p 271.
21. Masuda, H.; Fukuda, K. Science 1995, 268, 1466.
22. Li, A. P.; Müller, F.; Birner, A.; Nielsch, K.; Gösele, U. J. Vac. Sci. Technol. A 1999, 17, 1428.