Focused ion beam lithography and anodization combined nanopore patterning

Journal of Nanoscience and Nanotechnology

Volumn 10, Issue 10, 2010, Pages 6760-6768

  Lu, Kathy ^a   Zhao, Jingzhong ^a  

^a State University   (United States)

Author keywords

Anodization; Focused ion beam lithography; Nanopore pattern

Indexed keywords

ANODIZATIONS; HIGH PURITY ALUMINUM; INITIATION SITES; NANOPORE ARRAY; PORE ARRAYS; PORE DEVELOPMENT;

BEAM PLASMA INTERACTIONS; ELECTROLYTES; FOCUSED ION BEAMS; ION BEAM LITHOGRAPHY; ION BOMBARDMENT; IONS;

NANOPORES;

EID: 77958547853     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2010.2641     Document Type: Article

References (34)

1. Y. Li, Z. Y. Ling, S. S. Chen, and J. C. Wang, Nanotechnology 19, 225604 (2008).
2. H. Masuda and K. Fukuda, Science 268, 1466 (1995).
3. H. Masuda, K. Yasui, and K. Nishio, Adv. Mater. 12, 1031 (2000).
4. C. R. Martin, Science 266, 1961 (1994).
5. H. Chik and J. M. Xu, Mater. Sci. Eng. R 43, 103 (2004).
6. K. Nielsch, J. Choi, K. Schwirn, R. B. Wehrspohn, and U. Gosele, Nano Lett. 2, 677 (2002).
7. S. Ono and N. Masuko, Surf. Coat. Technol. 169, 139 (2003).
8. A. P. Li, F. Muller, A. Birner, K. Nielsch, and U. Gosele, J. Appl. Phys. 84, 6023 (1998).
9. H. Masuda, K. Yada, and A. Osaka, Jpn. J. Appl. Phys. 37, LI340 (1998).
10. S. Shingubara, O. Okino, Y. Sayama, H. Sakaue, and T. Takahagi, Jpn. J. Appl. Phys. 36, 7791 (1997).
11. H. Masuda, F. Hasegwa, and S. Ono, J. Electrochem. Soc. 144, L127 (1997).
12. S. Z. Chu, K. Wada, S. Inoue, M. Isogai, Y. Katsuta, and A. Yasumorib, J. Electrochem. Soc. 153, B384 (2006).
13. F. Y. Li, L. Zhang, and R. M. Metzger, Chem. Mater. 10, 2470 (1998).
14. C. H. Liu, J. A. Zapien, Y. Yao, X. M. Meng, C. S. Lee, S. S. Fan, Y. Lifshitz, and S. T. Lee, Adv. Mater. 15, 838 (2003).
15. H. Asoh, K. Nishio, M. Nakao, T. Tamamura, and H. Masuda, J. Electrochem. Soc. 148, B152 (2001).
16. L. A. Woldering, A. M. Otter, B. H. Husken, and W. L. Vos, Nanotechnology 17, 5717 (2006).
17. Y. Choi, S. Hong, and L. P. Lee, Nano Lett. 9, 3726 (2009).
18. J. Ketde, R. T. Hoyle. R. M. Perks, and S. Dimov, J. Vac. Sci. Technol B 26, 1794 (2008).
19. P. Kitslaar, M. Strassner, I. Sagnes, E. Bourhis, X. Lafosse, C. Ulysse, C. David, R. Jede, L. Bruchhaus, and J. Gierak, Micro-electron. Eng. 83, 811 (2006).
20. M. T. Wu, I. C. Leu, and M. H. Hon, J. Vac. Sci. Technol. B 20, 776 (2002).
21. G. Y. Zhao, C.-L. Xu, D.-J. Guo, H. Li, and H.-L. Li, J. Solid State Electrochem. 10, 266 (2006).
22. L.-B. Kong, Y. Huang, Y. Guo, and H. L. Li, Mater. Lett. 59, 1656 (2005).
23. V. V. Yuzhakov, H.-C. Chang, and A. E. Miller, Phys. Rev. B 56, 12608 (1997).
24. Y. Matsui, K. Nishio, and H. Masuda, Jpn. J. Appl. Phys. 44, 7726 (2005).
25. R. M. Langford, P. M. Nellen, J. Gierak, and Y. Q. Fu, MRS Bull. 32, 417 (2007).
26. M. Catalano, A. Taurino, M. Lomascolo, A. Schertel, and A. Orchowski, Nanotechnology 17, 1758 (2006).
27. J. Gierak, E. Bourhis, A. Madouri, M. Strassner, I. Sagnes, S. Bouchoule, M. N. Mérat Combes, D. Mailly, P. Hawkes, R. Jede, L. Bardotti, B. Prével, A. Hannour, P. Mélinon, A. Perez, J. Ferré, J.-P. Jamet, A. Mougin, C. Chappert, and V. Mathet, J Microlith. Microfab. Microsyst. 5, 011011 (2006).
28. Y. K. Kim, A. J. Danner, J. J. Raftery, and K. D. Choquette, IEEE J. Sel. Top. Quantum Electron. 11, 1292 (2005).
29. K. Lu, J. Nanosci. Nanotechnol. 9, 2598 (2009).
30. W. Lee, R. Ji, U. Gosele, and K. Nielsch, Nat. Mater. 5, 741 (2006).
31. Y. Li, M. Zheng, L. Ma, and W. Shen, Nanotechnology 17, 5105 (2006).
32. K. Schwirn, W. Lee, R. Hillebrand, M. Steinhart, K. Nielsch, and U. Goesele, Nano 2, 302 (2008).
33. S. Ono, M. Saito, and H. Asoh, Electrochimica Acta 51, 827 (2005).
34. A. Pancholi, V. G. Stoleru, and C. D. Kell, Nanotechnology 18, 215607 (2007).