Electrical transport and magnetic properties of reactive sputtered polycrystalline Ti1-xCrxN films

Journal of Physics D: Applied Physics

Volumn 43, Issue 41, 2010, Pages

  Mi, W B ^a   Ye, T Y ^a   Wang, X C ^b   Tan, H ^a   Bai, H L ^a  

^a TIANJIN UNIVERSITY   (China)

^b TIANJIN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED MAGNETIC FIELDS; CR-DOPED; ELECTRICAL TRANSPORT; ENHANCED COERCIVITY; LOW TEMPERATURES; POLYCRYSTALLINE;

ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; MAGNETIC FIELD EFFECTS; MAGNETIC PROPERTIES; MAGNETORESISTANCE; METALLIC FILMS; SPIN DYNAMICS; THERMAL LOGGING; TITANIUM NITRIDE;

CHROMIUM;

EID: 78249252636     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/43/41/415003     Document Type: Article

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