Enhanced low-temperature magnetoresistance in facing-target reactive sputtered Ni-C Nx composite films

Applied Physics Letters

Volumn 89, Issue 24, 2006, Pages

  Wang, X C ^a   Mi, W B ^a   Jiang, E Y ^a   Bai, H L ^a  

^a TIANJIN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITE MATERIALS; ELECTRON TUNNELING; MAGNETORESISTANCE; NICKEL COMPOUNDS; PARTIAL PRESSURE; SPUTTERING; SUPERPARAMAGNETISM; THERMAL EFFECTS;

BLOCKING TEMPERATURES; COMPOSITE FILMS; NITROGEN PARTIAL PRESSURE; TUNNELING MAGNETORESISTANCE;

METALLIC FILMS;

EID: 33845780623     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2408632     Document Type: Article

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