Path-related unexpected injection charges in BaTiO3 ferroelectric thin films studied by Kelvin force microscopy

Applied Physics Letters

Volumn 97, Issue 16, 2010, Pages

  Guo, Huifen ^a   Cheng, Gang ^a   Wang, Shujie ^a   Dai, Shuxi ^a   Wu, Sixin ^a   Zhou, Shaomin ^a   Li, Yuncai ^a   Du, Zuliang ^a  

^a HENAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COLLECTIVE EFFECTS; DOT ARRAY; KELVIN FORCE MICROSCOPY; POTENTIAL DIFFERENCE;

BARIUM COMPOUNDS; FERROELECTRIC THIN FILMS; FERROELECTRICITY; SCANNING PROBE MICROSCOPY;

FERROELECTRIC FILMS;

EID: 77958460512     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3499749     Document Type: Article

References (19)

1. C. H. Ahn, T. Tybell, L. Antognazza, K. Char, R. H. Hammond, M. R. Beasley,. Fischer, and J. -M. Triscone, Science 0036-8075 276, 1100 (1997). 10.1126/science.276.5315.1100
2. P. Paruch, T. Tybell, and J. -M. Triscone, Appl. Phys. Lett. 0003-6951 79, 530 (2001). 10.1063/1.1388024
3. J. Y. Son, C. S. Park, S. -K. Kim, and Y. -H. Shin, J. Appl. Phys. 0021-8979 104, 064101 (2008). 10.1063/1.2978220
4. S. Bühlmann, E. Colla, and P. Muralt, Phys. Rev. B 0556-2805 72, 214120 (2005). 10.1103/PhysRevB.72.214120
5. Y. Kim, S. Bühlmann, S. Hong, S. -H. Kim, and K. No, Appl. Phys. Lett. 0003-6951 90, 072910 (2007). 10.1063/1.2679902
6. A. L. Kholkin, I. K. Bdikin, V. V. Shvartsman, and N. A. Pertsev, Nanotechnology 0957-4484 18, 095502 (2007). 10.1088/0957-4484/18/9/095502
7. X. J. Lou, M. Zhang, S. A. T. Redfern, and J. F. Scott, Phys. Rev. B 0556-2805 75, 224104 (2007). 10.1103/PhysRevB.75.224104
8. A. Q. Jiang, Y. Y. Lin, and T. A. Tang, J. Appl. Phys. 0021-8979 102, 074109 (2007). 10.1063/1.2786886
9. J. Y. Son, K. Kyhm, and J. H. Cho, Appl. Phys. Lett. 0003-6951 89, 092907 (2006). 10.1063/1.2339045
10. H. O. Jacobs, H. F. Knapp, and A. Stemmer, Rev. Sci. Instrum. 0034-6748 70, 1756 (1999). 10.1063/1.1149664
11. S. J. Wang, G. Cheng, X. H. Jiang, Y. C. Li, Y. B. Huang, and Z. L. Du, Appl. Phys. Lett. 0003-6951 88, 212108 (2006). 10.1063/1.2207498
12. G. Cheng, S. J. Wang, K. Cheng, X. H. Jiang, L. X. Wang, L. S. Li, Z. L. Du, and G. T. Zou, Appl. Phys. Lett. 0003-6951 92, 223116 (2008). 10.1063/1.2938694
13. X. Q. Chen, H. Yamada, T. Horiuchi, K. Matsushige, S. Watanabe, M. Kawai, and P. S. Weiss, J. Vac. Sci. Technol. B 1071-1023 17, 1930 (1999). 10.1116/1.590851
14. J. Y. Son, S. H. Bang, and J. H. Cho, Appl. Phys. Lett. 0003-6951 82, 3505 (2003). 10.1063/1.1576916
15. G. S. Wang, Q. Zhao, X. J. Meng, J. H. Chu, and D. Ŕmiens, J. Cryst. Growth 0022-0248 277, 450 (2005). 10.1016/j.jcrysgro.2005.01.099
16. H. Basantakumar Sharma and H. N. K. Sarma, Thin Solid Films 0040-6090 330, 178 (1998). 10.1016/S0040-6090(98)00551-3
17. J. Y. Son, B. G. Kim, C. H. Kim, and J. H. Cho, Appl. Phys. Lett. 0003-6951 84, 4971 (2004). 10.1063/1.1762974
18. Y. Kim, C. Bae, K. Ryu, H. Ko, Y. K. Kim, S. Hong, and H. Shin, Appl. Phys. Lett. 0003-6951 94, 032907 (2009). 10.1063/1.3046786
19. See supplementary material at http://dx.doi.org/10.1063/1.3499749 E-APPLAB-97-062041 for (1) the control experiments and (2) the detailed calculation expressions of the potential distributions.