Cathodic arc co-deposition of highly oriented hexagonal Ti and Ti 2AlC MAX phase thin films

Thin Solid Films

Volumn 519, Issue 2, 2010, Pages 766-769

  Guenette, M C ^a   Tucker, M D ^a   Ionescu, M ^b   Bilek, M M M ^a   McKenzie, D R ^a  

^a UNIVERSITY OF SYDNEY   (Australia)

^b AUSTRALIAN NUCLEAR SCIENCE AND TECHNOLOGY ORGANISATION   (Australia)

Author keywords

Epitaxy; MAX phase; Physical vapor deposition; Pulsed cathodic arc; Thin film; Titanium aluminum carbide; X ray diffraction

Indexed keywords

CATHODIC ARC; CERAMIC PROPERTIES; CODEPOSITION; ELECTRICAL RESISTIVITY; ELEMENTAL COMPOSITIONS; EPITAXIAL RELATIONSHIPS; EPITAXY; IN-PLANE; MAX PHASE; MAX PHASIS; NANOLAMINATE; PULSED CATHODIC ARC; SEED LAYER; SINGLE CRYSTAL SUBSTRATES; TITANIUM ALUMINUM CARBIDE;

ALUMINUM; CARBIDES; DEPOSITION; DIFFRACTION; ELECTRIC CONDUCTIVITY; EPITAXIAL FILMS; EPITAXIAL GROWTH; PHYSICAL VAPOR DEPOSITION; SINGLE CRYSTALS; SUBSTRATES; TITANIUM; X RAY DIFFRACTION;

ALUMINUM COATINGS;

EID: 77958455861     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.09.007     Document Type: Article

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