Growth and characterization of MAX-phase thin films

Surface and Coatings Technology

Volumn 193, Issue 1-3 SPEC. ISS., 2005, Pages 6-10

  Högberg, Han ^a   Hultman, L ^a   Emmerlich, J ^a   Joelsson, T ^a   Eklund, P ^a   Molina Aldareguia, J M ^b   Palmquist, J P ^c   Wilhelmsson, O ^c   Jansson, U ^c  

^a LINKÖPING UNIVERSITY   (Sweden)

^b CEIT   (Spain)

^c UPPSALA UNIVERSITY   (Sweden)

Author keywords

Epitaxial growth; Magnetron sputtering; MAX phases; PVD process; Ti3SiC2

Indexed keywords

ELECTRIC CONDUCTIVITY; EPITAXIAL GROWTH; FILM GROWTH; INDENTATION; MAGNETRON SPUTTERING; NUCLEATION; TITANIUM CARBIDE;

COHESIVE DELAMINATION; EPITAXIAL FILMS; NANOINDENTATION;

THIN FILMS;

VAPOR DEPOSITION;

EID: 13844264187     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.08.174     Document Type: Article

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