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Volumn 26, Issue 10, 2010, Pages 2625-2632

Electrodeposition of copper in a citrate bath and its application to a micro-electro-mechanical system

Author keywords

Citrate; Copper; Deposit characterization; Electrodeposition; Micro electro mechanical system; Planar inductor; References

Indexed keywords


EID: 77958030835     PISSN: 10006818     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (10)

References (21)
  • 8
    • 77958034318 scopus 로고    scopus 로고
    • Beijing: Chemical Industry Press
    • Tohru, W. Nanoplating. Beijing: Chemical Industry Press, 2007: 10
    • (2007) Nanoplating , pp. 10
    • Tohru, W.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.