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Volumn 508, Issue 2, 2010, Pages 523-527

Mechanical properties of the hexagonal HoMnO3 thin films by nanoindentation

(8) Yen, Cheng Yo a Jian, Sheng Rui a Lai, Yi Shao b Yang, Ping Feng b Liao, Ying Yen c Jang, Jason Shian Ching d Lin, Tjung Han e Juang, Jenh Yih e

a I SHOU UNIVERSITY (Taiwan)

b ADVANCED SEMICONDUCTOR ENGINEERING INC (Taiwan)

c NATIONAL UNIVERSITY OF KAOHSIUNG (Taiwan)

d NATIONAL CENTRAL UNIVERSITY (Taiwan)

e NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

Author keywords

Hardness; Hexagonal HoMnO3 thin films; Nanoindentation; XRD

Indexed keywords

CONTINUOUS STIFFNESS MEASUREMENT; DISLOCATION ACTIVITY; HEXAGONAL HOMNO3 THIN FILMS; LOAD-DISPLACEMENT CURVE; NANOINDENTATION TECHNIQUES; NANOINDENTATION TESTS; ROOM TEMPERATURE; SECONDARY PHASIS; XRD; YOUNG'S MODULUS;

ATOMIC FORCE MICROSCOPY; ELASTIC MODULI; ELASTICITY; FRACTURE TOUGHNESS; HARDNESS; MECHANICAL PROPERTIES; NANOINDENTATION; PULSED LASER DEPOSITION; SULFUR COMPOUNDS; THIN FILMS; UNLOADING; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

DEPOSITION;

EID: 77957881752 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2010.08.109 Document Type: Article

Times cited : (29)

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