Low-temperature deposition of transparent conducting Mn-W co-doped ZnO thin films

Journal of Semiconductors

Volumn 31, Issue 8, 2010, Pages

  Huafu, Zhang ^a   Hanfa, Liu ^a   Chengxin, Lei ^a   Aiping, Zhou ^a   Changkun, Yuan ^a  

^a SHANDONG UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Magnetron sputtering; Mn W co doped ZnO films; Sputtering power; Transparent conducting films

Indexed keywords

CO-DOPED ZNO; CRYSTALLINITIES; DEPOSITED FILMS; DIRECT CURRENT MAGNETRON SPUTTERING; ELECTRICAL AND OPTICAL PROPERTIES; GLASS SUBSTRATES; HEXAGONAL STRUCTURES; HIGH TRANSMITTANCE; HIGH TRANSPARENCY; LOW RESISTIVITY; LOW TEMPERATURES; LOW-TEMPERATURE DEPOSITION; MN-W CO-DOPED ZNO FILMS; OPTICAL TRANSMITTANCE; POLYCRYSTALLINE; PREFERRED ORIENTATIONS; SPUTTERING POWER; TRANSPARENT CONDUCTING FILMS; VISIBLE RANGE;

DC POWER TRANSMISSION; DEPOSITION; ELECTRIC PROPERTIES; MAGNETRON SPUTTERING; MANGANESE; MANGANESE COMPOUNDS; METALLIC FILMS; OPTICAL PROPERTIES; SUBSTRATES; THIN FILMS; ZINC OXIDE;

CONDUCTIVE FILMS;

EID: 77957858367     PISSN: 16744926     EISSN: None     Source Type: Journal    
DOI: 10.1088/1674-4926/31/8/083005     Document Type: Article

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