Spray deposition and property analysis of anatase phase titania (TiO 2) nanostructures

Thin Solid Films

Volumn 519, Issue 1, 2010, Pages 129-135

  Raj, A Moses Ezhil ^a   Agnes, V ^a   Bena Jothy, V ^b   Ravidhas, C ^c   Wollschläger, Joachim ^d   Suendorf, M ^d   Neumann, M ^d   Jayachandran, M ^e   Sanjeeviraja, C ^f  

^a SCOTT CHRISTIAN COLLEGE AUTONOMOUS   (India)

^b WOMEN S CHRISTIAN COLLEGE   (India)

^c BISHOP HEBER COLLEGE   (India)

^d UNIVERSITY OF OSNABRÜCK   (Germany)

^e CENTRAL ELECTROCHEMICAL RESEARCH INSTITUTE   (India)

^f ALAGAPPA UNIVERSITY   (India)

Author keywords

Atomic force microscopy; Conductivity; Microstructure; Optical properties; Spray pyrolysis; Thin films; Titanium dioxide; X ray photoelectron spectroscopy

Indexed keywords

ACETYLACETONATES; ANATASE PHASE; ATOMIC FORCE; CARRIER DENSITY; CHEMICAL SPRAY PYROLYSIS; CONDUCTIVITY; DC ELECTRICAL CONDUCTIVITY; ELECTROCATALYTIC; GLASS SUBSTRATES; HALL MEASUREMENTS; MEAN FREE PATH; NANOCRYSTALLINES; NANOSIZED GRAINS; OPTICAL AND ELECTRICAL PROPERTIES; OPTICAL TRANSMITTANCE; P-TYPE; POROUS NATURE; ROUGH SURFACES; SPRAY DEPOSITION; TIO; TITANIA; TITANIUM DIOXIDE THIN FILM; VARIOUS SUBSTRATES;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; ATOMS; CARRIER MOBILITY; CRACKING (CHEMICAL); ELECTRIC CONDUCTIVITY; ELECTRONS; MICROSTRUCTURE; ORGANIC POLYMERS; OXIDES; PHOTOELECTRICITY; PHOTONS; REFRACTIVE INDEX; SPRAY PYROLYSIS; STOICHIOMETRY; SUBSTRATES; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY; X RAYS;

OPTICAL FILMS;

EID: 77957721985     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.07.073     Document Type: Article

References (59)

1. M. Miki-Yoshida, V. Collins-Martinez, P. Amezaga-Madrid, and A. Aguilar-Elguezabal Thin Solid Films 419 2002 60
2. C.C. Wang, Z. Zhang, and J.Y. Ying Nanostruct. Mater. 9 1997 583
3. H. Harada, and T. Veda Chem. Phys. Lett. 106 1984 229
4. R.I. Bickly, T. Gonzalez-Carreno, J.S. Lees, L. Palmisano, and R.J.D. Tilley J. Solid State Chem. 92 1991 178
5. Y. Leprince-Wang, and K. Yu-Zhang Surf. Coat. Technol. 140 2001 155
6. J.-M. Herrmann J. Catal. Today 53 1999 115
7. K. Tanaka, T. Hisansga, and A.P. Rivera D.F. Ollisand, H. Ai-Ekabi, Photocatalytic Purification and Treatment of Water and Air 1993 Elsevier Science Publishers
8. K. Ishibashi, A. Fujishima, T. Watanabe, and K. Hashimoto J. Photochem. Photobiol. A 134 2000 139
9. J.-M. Herrmann J. Catal. Today 53 1999 115
10. N.G. Park, J.V. Lagematt, and A.J. Frank J. Phys. Chem. B 104 2000 8989
11. H.K. Hu, M. Yoshimoto, H. Koinuma, B.K. Moon, and H. Ishiwara Appl. Phys. Lett. 68 1996 2965
12. T. Houzouji, N. Saito, A. Kudo, and S. Takata Chem. Phys. Lett. 254 1996 109
13. Z. Chen, P. Sana, J. Salami, and A. Rohatgi IEEE Trans. Electron Devices 40 1993 1161
14. H. Kuster, and J. Erbert Thin Solid Films 70 1980 43
15. P.S. Patil Mater. Chem. Phys. 59 1999 185
16. A.H. Lefebvre Atomization and Sprays 1989 Hemisphere New York
17. L. Bayvel, and Z. Orzechowski Liquid Atomization 1993 Taylor & Francis Washington, DC
18. R. Sivakumar, A. Moses Ezhil Raj, B. Subramanian, M. Jayachandran, and C. Sanjeeviraja Mater. Res. Bull. 39 2004 1479
19. A. Moses Ezhil Raj, V. Senthil Kumar, M. Jayachandran, and C. Sanjeeviraja Physica B 403 2008 544
20. A. Moses Ezhil Raj, G. Selvan, C. Ravidhas, M. Jayachandran, and C. Sanjeeviraja J. Colloid Inter. Sci. 328 2008 396
21. A. Moses Ezhil Raj, V. Senthilkumar, V. Swaminathan, Joachim Wollschläger, M. Suendorf, M. Neumann, M. Jayachandran, and C. Sanjeeviraja Thin Solid Films 517 2008 510
22. H.P. Deshmukha, P.S. Shinde, and P.S. Patil Mater. Sci. Engin. B 130 2006 220
23. P.S. Shinde, S.B. Sadale, P.S. Patil, P.N. Bhosale, A. Brüger, M. Neumann-Spallart, and C.H. Bhosale Sol. Energy Mater. Sol. Cells 92 2008 283
24. M. Lazzeri, A. Vittadini, and A. Selloni Phys. Rev. B 65 2002 119901/1
25. M.L. Hitchman, and J. Zhao J. Physique IV 9 1999 348
26. D. Leinen, J.P. Espinas, A. Fernandez, and A.R. Gonzalez-Elipe J. Vac. Sci. Technol. A 12 1994 5
27. M. Lazzeri, A. Vittadini, and A. Selloni Phys. Rev. B 63 2001 155409/1
28. M. Lazzeri, A. Vittadini, and A. Selloni Phys. Rev. B 65 2002 119901/1
29. B.D. Cullity Elements of X-ray diffraction 1978 Addison Wesley Publishing Company Inc. London
30. David R. Lide, CRC Handbook of Chemistry and Physics 2005 CRC Press Boca Raton, FL
31. D.H. Solomon, and D.G. Hawthorne Chemistry of Pigments and Fillers 1983 Wiley New York
32. J. Yu, X. Zhao, J. Du, and W. Chen J. Sol-Gel Sci. Technol. 17 2000 163
33. J. Liqiang, Z. Xu, X. Sun, J. Shang, and W. Cai Appl. Surf. Sci. 180 2001 308
34. J. Liqiang, S. Xiaojun, C. Weimin, X. Zili, D. Yaoguo, and F. Honggang J. Phys. Chem. Solids 64 2003 615
35. S.-R. Morrison The Chemical Physics of Surfaces 1977 Plenum Press New York
36. L. Paulin The Nature of the Chemical Bond 3 rd Ed. 1960 CorneIl Univ. Press New York
37. J.F. Moulder Handbook of X-ray Photoelectron Spectroscopy 1992 Perkin-Elmer Corporation Physical Electronics Division
38. Geert Silversmit, Geert De Doncker, and Roger De Gryse Surf. Sci. Spectra 9 2002 21
39. R. Sanjines, H. Tang, H. Berger, F. Gozzo, G. Margaritondo, and F. Levy J. Appl. Phys. 75 1994 247
40. L.S. Kasten, J.T. Grant, N. Grebasch, N. Voevodin, F.E. Arnold, and M.S. Donley Surf. Coat. Technol. 140 2001 11
41. J.F. Moulder, W.F. Stickle, P.E. Sobol, and K.D. Bomben J. Chastain, Handbook of X-ray Photoelectron Spectroscopy 1992 Perkin-Elmer Corp USA
42. Y. Naganuma, S. Tanaka, and C. Kato Jpn. J. Appl. Phys. 43 2004 6315
43. M.P. Seah, and W.A. Dench Surface and Interface Analysis 1 1979 1
44. F.H. Scofield J. Electron Spectrosc. Relat. Phenom. 8 1976 129
45. C.J. Powell, and P.E. Larson Appl. Surf. Sci. 1 1978 186
46. J. Cazaux Appl. Surf. Sci. 10 1982 124
47. R.F. Reilman, A. Msezane, and S.T. Manson J. Electron Spectrosc. Relat. Phenom. 8 1976 389
48. C. Chen, E.M. Kelder, P.J.J.M. van der Put, and J. Schoonman J. Mater. Chem. 6 1996 765
49. W.C. Hinds Aerosol Technology 1982 John Wiley and Sons New York
50. C. Kormann, D.W. Bahnemann, and M.R. Hoffmann J. Phys. Chem. 92 1988 5196
51. T.M.R. Viseu, B. Almeida, M. Stchakovsky, B. Drevillon, M.I.C. Ferreira, and J.B. Sousa Thin Solid Films 401 2001 216
52. H. Haug, and S.W. Koch Quantum Theory of the Optical and Electronic Properties of Semiconductors 3rd Edi 1990 World Scientific Publishing Co
53. H. Tang, K. Prasad, R. Sanjinés, P.E. Schmid, and F. Lévy J. Appl. Phys. 75 1994 2042
54. R. Swanepoel J. Phys. E: Sci. Instrum. 16 1983 1214
55. V. Mikhelashvili, and G. Eisenstein J. Appl. Phys. 89 2001 3256
56. H.J. Hovel J. Electrochem. Soc. 125 1978 983
57. K. Kinosita, and M. Nishibari J. Vac. Sci. Technol. 6 1969 730
58. Diana Mardare, and G.I. Rusu Mat. Sci. Engineer. B 75 2000 68
59. D.S. Campbell The use of Thin films in physical investigations 1966 Academic Press New York