Preparation and characterization of spray deposited n-type WO3 thin films for electrochromic devices

Materials Research Bulletin

Volumn 39, Issue 10, 2004, Pages 1479-1489

  Sivakumar, R ^a   Raj, A Moses Ezhil ^b   Subramanian, B ^c   Jayachandran, M ^c   Trivedi, D C ^c   Sanjeeviraja, C ^a  

^a ALAGAPPA UNIVERSITY   (India)

^b SCOTT CHRISTIAN COLLEGE AUTONOMOUS   (India)

^c CENTRAL ELECTROCHEMICAL RESEARCH INSTITUTE   (India)

Author keywords

A. Thin films; B. Intercalation reactions; C. X ray diffraction; D. Electrochemical properties

Indexed keywords

ELECTROCHEMISTRY; ELECTROCHROMIC DEVICES; ELECTRODES; LIGHT ABSORPTION; MORPHOLOGY; POLYCRYSTALLINE MATERIALS; PROPYLENE; PYROLYSIS; SEMICONDUCTOR DOPING; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

ELECTROCHEMICAL PROPERTIES; INTERCALATION REACTIONS; SPRAY PYROLYSIS;

THIN FILMS;

EID: 3042853794     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.materresbull.2004.04.023     Document Type: Article

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