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Journal of Colloid and Interface Science

Volumn 328, Issue 2, 2008, Pages 396-401

Magnesium indium oxide (MgIn 2O 4) spinel thin films: Chemical spray pyrolysis (CSP) growth and materials characterizations

(5) Ezhil Raj, A Moses a Selvan, G b Ravidhas, C c Jayachandran, M d Sanjeeviraja, C e

a SCOTT CHRISTIAN COLLEGE AUTONOMOUS (India)

b THANTHAI HANS ROEVER COLLEGE (India)

c BISHOP HEBER COLLEGE (India)

d CENTRAL ELECTROCHEMICAL RESEARCH INSTITUTE (India)

e ALAGAPPA UNIVERSITY (India)

Author keywords

AFM; Semiconductor; Thin films; XRD

Indexed keywords

AFM; CHEMICAL SPRAY PYROLYSIS; DIFFUSION ACTIVATION ENERGY; ELECTRICAL CONDUCTIVITY; FTIR; GLASS SUBSTRATES; HALL COEFFICIENT; INDIUM OXIDE; INDIUM OXIDE FILMS; INVERSE SPINEL STRUCTURES; MATERIALS CHARACTERIZATION; NANOCRYSTALLINE FILMS; OPTICAL TRANSPARENCY; OPTOELECTRONIC DEVICE FABRICATION; SINGLE PHASE; SPRAY-PYROLYSIS TECHNIQUES; TRANSPARENT MATERIAL; VISIBLE RANGE; XRD; XRD ANALYSIS;

ACTIVATION ENERGY; ATOMIC FORCE MICROSCOPY; ELECTRIC CONDUCTIVITY; GROWTH (MATERIALS); INDIUM; MAGNESIUM; OXIDE FILMS; SEMICONDUCTOR MATERIALS; SPRAY PYROLYSIS; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION; X RAY SPECTROSCOPY;

FILM PREPARATION;

EID: 77957699244 PISSN: 00219797 EISSN: 10957103 Source Type: Journal
DOI: 10.1016/j.jcis.2008.08.052 Document Type: Article

Times cited : (10)

References (24)

1
- 36549099749
- Hamberg I., Granqvist C.G. J. Appl. Phys. 1986, 60:R123.
- (1986) J. Appl. Phys. , vol.60
- Hamberg, I.¹ Granqvist, C.G.²

2
- 0022146289
- Minami T., Sato H., Nanto H., Takata S. Jpn. J. Appl. Phys. 1985, 24:L781.
- (1985) Jpn. J. Appl. Phys. , vol.24
- Minami, T.¹ Sato, H.² Nanto, H.³ Takata, S.⁴

3
- 0642334666
- Dou Y., Egdell G. Phys. Rev. B 1996, 53:15405.
- (1996) Phys. Rev. B , vol.53 , pp. 15405
- Dou, Y.¹ Egdell, G.²

4
- 0022034213
- Budzynska K., Leja E., Skrztpek S. Sol. Energy Mater. 1985, 12:57.
- (1985) Sol. Energy Mater. , vol.12 , pp. 57
- Budzynska, K.¹ Leja, E.² Skrztpek, S.³

5
- 0035894226
- Kammler D.R., Mason T.O., Young D.L., Coutts T.J., Ko D., Poeppelmerer K.R., Williamson D.L. J. Appl. Phys. 2001, 90:5979.
- (2001) J. Appl. Phys. , vol.90 , pp. 5979
- Kammler, D.R.¹ Mason, T.O.² Young, D.L.³ Coutts, T.J.⁴ Ko, D.⁵ Poeppelmerer, K.R.⁶ Williamson, D.L.⁷

6
- 21544434972
- Kawazoe H., Ueda N., Un'no H., Omata T., Hosono H., Tanoue H. J. Appl. Phys. 1994, 76:7935.
- (1994) J. Appl. Phys. , vol.76 , pp. 7935
- Kawazoe, H.¹ Ueda, N.² Un'no, H.³ Omata, T.⁴ Hosono, H.⁵ Tanoue, H.⁶

7
- 21544449791
- Ueda N., Omata T., Hikuma N., Udea K., Mizoguchi H., Hashimoto T., Kawazoe H. Appl. Phys. Lett. 1992, 61:1954.
- (1992) Appl. Phys. Lett. , vol.61 , pp. 1954
- Ueda, N.¹ Omata, T.² Hikuma, N.³ Udea, K.⁴ Mizoguchi, H.⁵ Hashimoto, T.⁶ Kawazoe, H.⁷

8
- 0027542525
- Omata T., Ueda N., Hikuma N., Udea K., Mizoguchi H., Hashimoto T., Kawazoe H. Appl. Phys. Lett. 1993, 62:499.
- (1993) Appl. Phys. Lett. , vol.62 , pp. 499
- Omata, T.¹ Ueda, N.² Hikuma, N.³ Udea, K.⁴ Mizoguchi, H.⁵ Hashimoto, T.⁶ Kawazoe, H.⁷

9
- 0028368822
- Omata T., Ueda N., Ueda K., Hawazoe H. Appl. Phys. Lett. 1994, 64:1077.
- (1994) Appl. Phys. Lett. , vol.64 , pp. 1077
- Omata, T.¹ Ueda, N.² Ueda, K.³ Hawazoe, H.⁴

10
- 84990658241
- Enoki H., Nakayama T., Echigoya J. Phys. Status Solidi A 1992, 129:181.
- (1992) Phys. Status Solidi A , vol.129 , pp. 181
- Enoki, H.¹ Nakayama, T.² Echigoya, J.³

11
- 0033635055
- Sirimanne P.M., Sonoyama N., Sakata T. J. Solid State Chem. 2000, 154:476.
- (2000) J. Solid State Chem. , vol.154 , pp. 476
- Sirimanne, P.M.¹ Sonoyama, N.² Sakata, T.³

12
- 84948365265
- Yamanaka T., Takeuchi Y. Z. Kristallogr. 1983, 165:65.
- (1983) Z. Kristallogr. , vol.165 , pp. 65
- Yamanaka, T.¹ Takeuchi, Y.²

13
- 4243977977
- Wei S.-H., Zhang S.B. Phys. Rev. B 2001, 63:45112.
- (2001) Phys. Rev. B , vol.63 , pp. 45112
- Wei, S.-H.¹ Zhang, S.B.²

14
- 0004792634
- Van Boort H.J.J., Groth R. Philos. Tech. Rev. 1968, 29:17.
- (1968) Philos. Tech. Rev. , vol.29 , pp. 17
- Van Boort, H.J.J.¹ Groth, R.²

15
- 0020128174
- Knako H., Miyake K. J. Appl. Phys. 1982, 53:3629.
- (1982) J. Appl. Phys. , vol.53 , pp. 3629
- Knako, H.¹ Miyake, K.²

16
- 0020102259
- Shanthi E., Banerjee A., Dutta V., Chopra K.L. J. Appl. Phys. 1982, 53:1615.
- (1982) J. Appl. Phys. , vol.53 , pp. 1615
- Shanthi, E.¹ Banerjee, A.² Dutta, V.³ Chopra, K.L.⁴

17
- 84859812945
- Mizuhashi M. Thin Solid Films 1980, 70:90.
- (1980) Thin Solid Films , vol.70 , pp. 90
- Mizuhashi, M.¹

18
- 0016594802
- Fan J.C.C., Bachner F.J. J. Electrochem. Soc. 1975, 122:1719.
- (1975) J. Electrochem. Soc. , vol.122 , pp. 1719
- Fan, J.C.C.¹ Bachner, F.J.²

19
- 34548550507
- Ezhil Raj A.M., Nehru L.C., Jayachandran M., Sanjeeviraja C. Cryst. Res. Technol. 2007, 42:867.
- (2007) Cryst. Res. Technol. , vol.42 , pp. 867
- Ezhil Raj, A.M.¹ Nehru, L.C.² Jayachandran, M.³ Sanjeeviraja, C.⁴

20
- 0003427458
- Addison-Wesley, MA
- Cullity B.D. Elements of X-Ray Diffraction 1956, Addison-Wesley, MA.
- (1956) Elements of X-Ray Diffraction
- Cullity, B.D.¹

21
- 0028735713
- Tanji H., Kurihara N., Yoshide M. J. Mater. Sci. Lett. 1994, 13:1673.
- (1994) J. Mater. Sci. Lett. , vol.13 , pp. 1673
- Tanji, H.¹ Kurihara, N.² Yoshide, M.³

22
- 0027667399
- Un'no H., Hikuma N., Omata T., Ueda N., Hashimoto T., Kawazoe H. Jpn. J. Appl. Phys. 1993, 32:1260.
- (1993) Jpn. J. Appl. Phys. , vol.32 , pp. 1260
- Un'no, H.¹ Hikuma, N.² Omata, T.³ Ueda, N.⁴ Hashimoto, T.⁵ Kawazoe, H.⁶

23
- 84859833776
- Digital Instruments, Nanoscope III Owner's Manual
- Digital Instruments, Nanoscope III Owner's Manual.

24
- 0031168763
- Li Y.G., Lusia A. J. Appl. Electrochem. 1997, 27:643.
- (1997) J. Appl. Electrochem. , vol.27 , pp. 643
- Li, Y.G.¹ Lusia, A.²

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