SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 519, Issue 1, 2010, Pages 499-504

Unipolar resistive switching behavior of BiFeO3 thin films prepared by chemical solution deposition

(2) Chen, Shih Wei a Wu, Jenn Ming a

a NATIONAL TSING HUA UNIVERSITY (Taiwan)

Author keywords

Bismuth ferrite; Chemical deposition; Ferroelectric properties; Unipolar resistive switching; X ray diffraction

Indexed keywords

BFO FILMS; BISMUTH FERRITES; CARRIER INJECTION; CHEMICAL DEPOSITION; CHEMICAL SOLUTION DEPOSITION; CHEMICAL SOLUTION DEPOSITION METHOD; CONDUCTING PATHS; CONDUCTION MECHANISM; ELECTRONIC CARRIERS; FERROELECTRIC PROPERTIES; HIGH-RESISTANCE STATE; INITIAL STATE; LOW-RESISTANCE STATE; OHMIC CONDUCTION; POOLE-FRENKEL EMISSION; POOLE-FRENKEL MODEL; RESISTANCE RATIO; RESISTANCE SWITCHING; RESISTIVE SWITCHING; RESISTIVE SWITCHING BEHAVIORS; SI SUBSTRATES; SPACE CHARGE LIMITED CONDUCTION;

BISMUTH; CHEMICALS; DEPOSITION; DIFFRACTION; FERRITE; FERROELECTRIC FILMS; FERROELECTRICITY; OXYGEN; OXYGEN VACANCIES; SWITCHING; SWITCHING SYSTEMS; THIN FILMS; X RAY DIFFRACTION;

CHEMICAL RESISTANCE;

EID: 77957693621 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2010.08.004 Document Type: Article

Times cited : (69)

References (25)

1
- 77957717079
- A. Sawa Mater. Today 11 2008 6
- (2008) Mater. Today , vol.11 , pp. 6
- Sawa, A.¹

2
- 34547306629
- K. Tsubouchi, I. Ohkubo, H. Kumigashira, M. Oshima, Y. Matsumoto, K. Itaka, T. Ohnishi, M. Lippmaa, and H. Koinuma Adv. Mater. 19 2007 1711
- (2007) Adv. Mater. , vol.19 , pp. 1711
- Tsubouchi, K.¹ Ohkubo, I.² Kumigashira, H.³ Oshima, M.⁴ Matsumoto, Y.⁵ Itaka, K.⁶ Ohnishi, T.⁷ Lippmaa, M.⁸ Koinuma, H.⁹

3
- 22144448904
- C. Rohde, B.J. Choi, D.S. Jeong, S. Choi, J.S. Zhao, and C.S. Hwang Appl. Phys. Lett. 86 2005 262907
- (2005) Appl. Phys. Lett. , vol.86 , pp. 262907
- Rohde, C.¹ Choi, B.J.² Jeong, D.S.³ Choi, S.⁴ Zhao, J.S.⁵ Hwang, C.S.⁶

4
- 19944434155
- S. Seo, M.J. Lee, D.H. Seo, E.J. Jeoung, D.S. Suh, Y.S. Joung, I.K. Yoo, I.R. Hwang, S.H. Kim, I.S. Byun, J.S. Kim, J.S. Choi, and B.H. Park Appl. Phys. Lett. 85 2004 5655
- (2004) Appl. Phys. Lett. , vol.85 , pp. 5655
- Seo, S.¹ Lee, M.J.² Seo, D.H.³ Jeoung, E.J.⁴ Suh, D.S.⁵ Joung, Y.S.⁶ Yoo, I.K.⁷ Hwang, I.R.⁸ Kim, S.H.⁹ Byun, I.S.¹⁰ Kim, J.S.¹¹ Choi, J.S.¹² Park, B.H.¹³

5
- 19944379530
- S. Kim, I. Byun, I. Hwang, J. Kim, J. Choi, B.H. Park, S. Seo, M.J. Lee, D.H. Seo, D.S. Suh, Y.S. Joung, and I.K. Yoo Jpn. J. Appl. Phys. Part 2 - Lett. Express Lett. 44 2005 L345
- (2005) Jpn. J. Appl. Phys. Part 2 - Lett. Express Lett. , vol.44 , pp. 345
- Kim, S.¹ Byun, I.² Hwang, I.³ Kim, J.⁴ Choi, J.⁵ Park, B.H.⁶ Seo, S.⁷ Lee, M.J.⁸ Seo, D.H.⁹ Suh, D.S.¹⁰ Joung, Y.S.¹¹ Yoo, I.K.¹²

6
- 34648835089
- A. Chen, S. Haddad, Y.C. Wu, Z. Lan, T.N. Fang, and S. Kaza Appl. Phys. Lett. 91 2007 123517
- (2007) Appl. Phys. Lett. , vol.91 , pp. 123517
- Chen, A.¹ Haddad, S.² Wu, Y.C.³ Lan, Z.⁴ Fang, T.N.⁵ Kaza, S.⁶

7
- 33947579332
- D. Lee, D.J. Seong, I. Jo, F. Xiang, R. Dong, S. Oh, and H. Hwang Appl. Phys. Lett. 90 2007 122104
- (2007) Appl. Phys. Lett. , vol.90 , pp. 122104
- Lee, D.¹ Seong, D.J.² Jo, I.³ Xiang, F.⁴ Dong, R.⁵ Oh, S.⁶ Hwang, H.⁷

8
- 38349103053
- W.Y. Chang, Y.C. Lai, T.B. Wu, S.F. Wang, F. Chen, and M.J. Tsai Appl. Phys. Lett. 92 2008 022110
- (2008) Appl. Phys. Lett. , vol.92 , pp. 022110
- Chang, W.Y.¹ Lai, Y.C.² Wu, T.B.³ Wang, S.F.⁴ Chen, F.⁵ Tsai, M.J.⁶

9
- 10044237971
- A. Sawa, T. Fujii, M. Kawasaki, and Y. Tokura Appl. Phys. Lett. 85 2004 4073
- (2004) Appl. Phys. Lett. , vol.85 , pp. 4073
- Sawa, A.¹ Fujii, T.² Kawasaki, M.³ Tokura, Y.⁴

10
- 0000748226
- S.Q. Liu, N.J. Wu, and A. Ignatiev Appl. Phys. Lett. 76 2000 2749
- (2000) Appl. Phys. Lett. , vol.76 , pp. 2749
- Liu, S.Q.¹ Wu, N.J.² Ignatiev, A.³

11
- 0035806023
- Y. Watanabe, J.G. Bednorz, A. Bietsch, C. Gerber, D. Widmer, A. Beck, and S.J. Wind Appl. Phys. Lett. 78 2001 3738
- (2001) Appl. Phys. Lett. , vol.78 , pp. 3738
- Watanabe, Y.¹ Bednorz, J.G.² Bietsch, A.³ Gerber, C.⁴ Widmer, D.⁵ Beck, A.⁶ Wind, S.J.⁷

12
- 0001331485
- A. Beck, J.G. Bednorz, C. Gerber, C. Rossel, and D. Widmer Appl. Phys. Lett. 77 2000 139
- (2000) Appl. Phys. Lett. , vol.77 , pp. 139
- Beck, A.¹ Bednorz, J.G.² Gerber, C.³ Rossel, C.⁴ Widmer, D.⁵

13
- 39349109608
- H. Kohlstedt, A. Petraru, K. Szot, A. Rüdiger, P. Meuffels, H. Haselier, R. Waser, and V. Nagarajan Appl. Phys. Lett. 92 2008 062907
- (2008) Appl. Phys. Lett. , vol.92 , pp. 062907
- Kohlstedt, H.¹ Petraru, A.² Szot, K.³ Rüdiger, A.⁴ Meuffels, P.⁵ Haselier, H.⁶ Waser, R.⁷ Nagarajan, V.⁸

14
- 36149023551
- M.A. Lampert Phys. Rev. 103 1956 1648
- (1956) Phys. Rev. , vol.103 , pp. 1648
- Lampert, M.A.¹

15
- 77952708667
- J.H. Kim, H. Funakubo, Y. Sugiyama, and H. Ishiwara Jpn. J. Appl. Phys. 48 2009 09KB02
- (2009) Jpn. J. Appl. Phys. , vol.48
- Kim, J.H.¹ Funakubo, H.² Sugiyama, Y.³ Ishiwara, H.⁴

16
- 70349488343
- Z. Zhong, and H. Ishiwara Appl. Phys. Lett. 95 2009 112902
- (2009) Appl. Phys. Lett. , vol.95 , pp. 112902
- Zhong, Z.¹ Ishiwara, H.²

17
- 34250965271
- W. Schottky Naturwissenchaftliche 26 1938 843
- (1938) Naturwissenchaftliche , vol.26 , pp. 843
- Schottky, W.¹

18
- 0000665290
- J. Frenkel Tech. Phys. USSR 5 1938 685
- (1938) Tech. Phys. USSR , vol.5 , pp. 685
- Frenkel, J.¹

19
- 0003703994
- Clarendon Oxford
- N.F. Mott, and R.W. Gurney Electronic Processes in Ionic Crystals 1940 Clarendon Oxford
- (1940) Electronic Processes in Ionic Crystals
- Mott, N.F.¹ Gurney, R.W.²

20
- 0004005306
- 2nd ed. Wiley New York
- S.M. Sze Physics of Semiconductor Devices 2nd ed. 1981 Wiley New York
- (1981) Physics of Semiconductor Devices
- Sze, S.M.¹

21
- 0000665814
- W.R. Harrell, and J. Frey Thin Solid Films 352 1999 195
- (1999) Thin Solid Films , vol.352 , pp. 195
- Harrell, W.R.¹ Frey, J.²

22
- 18844441261
- S. Iakovlev, C.-H. Solterbeck, M. Kuhnke, and M. Es-Souni J. Appl. Phys. 97 2005 094901
- (2005) J. Appl. Phys. , vol.97 , pp. 094901
- Iakovlev, S.¹ Solterbeck, C.-H.² Kuhnke, M.³ Es-Souni, M.⁴

23
- 0030142234
- C.H. Chen, and S.W. Cheong Phys. Rev. Lett. 76 1996 4042
- (1996) Phys. Rev. Lett. , vol.76 , pp. 4042
- Chen, C.H.¹ Cheong, S.W.²

24
- 34247877733
- X. Wu, P. Zhou, J. Li, L.Y. Chen, H. Lin, and T.A. Tang Appl. Phys. Lett. 90 2007 183507
- (2007) Appl. Phys. Lett. , vol.90 , pp. 183507
- Wu, X.¹ Zhou, P.² Li, J.³ Chen, L.Y.⁴ Lin, H.⁵ Tang, T.A.⁶

25
- 33751076522
- M.P. Singh, L. Mechin, W. Prellier, and M. Maglione Appl. Phys. Lett. 89 2006 202906
- (2006) Appl. Phys. Lett. , vol.89 , pp. 202906
- Singh, M.P.¹ Mechin, L.² Prellier, W.³ Maglione, M.⁴

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.