High-throughput characterization of metal electrode performance for electric-field-induced resistance switching in metal/Pr0.7Ca 0.3MnO3/metal structures

Advanced Materials

Volumn 19, Issue 13, 2007, Pages 1711-1713

  Tsubouchi, Kenta ^a   Ohkubo, Isao ^a   Kumigashira, Hiroshi ^a   Oshima, Masaharu ^a   Matsumoto, Yuji ^b   Itaka, Kenji ^c   Ohnishi, Tsuyoshi ^a   Lippmaa, Mikk ^a   Koinuma, Hideomi ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC FIELD EFFECTS; ELECTRODES; PRASEODYMIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

ELECTRODE EXPLORATION; RESISTANCE-SWITCHING MEMORY DEVICES;

CRYSTAL STRUCTURE;

EID: 34547306629     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200601957     Document Type: Article

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