Silicon surface processing techniques for micro-systems fabrication

Thin Solid Films

Volumn 438-439, Issue , 2003, Pages 445-451

  Mizeikis, Vygantas ^a   Juodkazis, Saulius ^a   Ye, Jia Yu ^a   Rode, Andrei ^a,b   Matsuo, Shigeki ^a   Misawa, Hiroaki ^a  

^a UNIVERSITY OF TOKUSHIMA   (Japan)

^b AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

Laser ablation; Nanostructures; Optoelectronic devices; Silicon

Indexed keywords

CRYSTAL LATTICES; CRYSTALS; ELECTRON BEAM LITHOGRAPHY; LASER ABLATION; PHOTONS; REACTIVE ION ETCHING; SILICON WAFERS; SURFACE PHENOMENA; THIN FILMS;

HOLE DRILLING;

MICROMACHINING;

EID: 0043028632     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00803-4     Document Type: Conference Paper

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