An investigation of structural phase transformation and electrical resistivity in Ta films

Applied Surface Science

Volumn 257, Issue 4, 2010, Pages 1211-1215

  Javed, A ^a   Sun, Ji Bing ^b  

^a UNIVERSITY OF SHEFFIELD   (United Kingdom)

^b HEBEI UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Electrical resistivity; Growth parameters; Metallic films; Phase transformation; Surface roughness

Indexed keywords

ELECTRIC CONDUCTIVITY; FILM THICKNESS; GLASS; METALLIC FILMS; PHASE TRANSITIONS; SURFACE ROUGHNESS; TANTALUM; X RAY DIFFRACTION ANALYSIS;

ALPHA PHASE; BULK RESISTIVITY; GLASS SUBSTRATES; GROWTH PARAMETERS; NATIVE OXIDES; SPUTTER PRESSURE; STRUCTURAL PHASE TRANSFORMATIONS; TANTALUM (TA);

SUBSTRATES;

EID: 77957138725     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.08.023     Document Type: Article

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