In situ phase evolution study in magnetron sputtered tantalum thin films

Thin Solid Films

Volumn 420-421, Issue , 2002, Pages 287-294

  Lee, S L ^a   Windover, D ^b   Lu, T M ^b   Audino, M ^a  

^a Benet Laboratories   (United States)

^b RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

2D detector; In situ characterization; Magnetron sputtering; Real time XRD; Tantalum

Indexed keywords

ARGON; CRYSTAL STRUCTURE; FILM GROWTH; GLASS; INTERFACES (MATERIALS); MAGNETRON SPUTTERING; SPUTTER DEPOSITION; TANTALUM; X RAY DIFFRACTION;

REFRACTORY COATINGS;

THIN FILMS;

EID: 0037011135     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00941-0     Document Type: Conference Paper

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