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Volumn 84, Issue 2, 2009, Pages 330-334

Structure and properties of Ta/TaOx barrier films deposited by direct current magnetron sputtering

Author keywords

Crystal structure; Sputtering; Surface properties; Ta; TaOx; Thin films

Indexed keywords

AUGER ELECTRON MICROSCOPY; AVERAGE GRAIN SIZE; BARRIER FILMS; DIRECT CURRENT MAGNETRON SPUTTERING; DOUBLE LAYERS; GAS-FLOW RATIO; GLASS SUBSTRATES; OXYGEN FLOW RATIOS; PREFERRED GROWTH; STRUCTURE AND PROPERTIES; TA; TA FILMS; TAOX;

EID: 69349095454     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2009.07.004     Document Type: Article
Times cited : (5)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.