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Volumn 84, Issue 2, 2009, Pages 330-334
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Structure and properties of Ta/TaOx barrier films deposited by direct current magnetron sputtering
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Author keywords
Crystal structure; Sputtering; Surface properties; Ta; TaOx; Thin films
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Indexed keywords
AUGER ELECTRON MICROSCOPY;
AVERAGE GRAIN SIZE;
BARRIER FILMS;
DIRECT CURRENT MAGNETRON SPUTTERING;
DOUBLE LAYERS;
GAS-FLOW RATIO;
GLASS SUBSTRATES;
OXYGEN FLOW RATIOS;
PREFERRED GROWTH;
STRUCTURE AND PROPERTIES;
TA;
TA FILMS;
TAOX;
ATOMIC FORCE MICROSCOPY;
CRYSTAL ATOMIC STRUCTURE;
MAGNETRONS;
OXYGEN;
SCANNING ELECTRON MICROSCOPY;
STRUCTURAL PROPERTIES;
SURFACE PROPERTIES;
SURFACE STRUCTURE;
TANTALUM;
THIN FILMS;
TRACE ANALYSIS;
X RAY DIFFRACTION ANALYSIS;
GAS PERMEABLE MEMBRANES;
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EID: 69349095454
PISSN: 0042207X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.vacuum.2009.07.004 Document Type: Article |
Times cited : (5)
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References (18)
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