Formation of low resistivity alpha Ta by ion beam sputtering

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 1 SPEC., 2003, Pages 237-240

  Zhang, Jinqiu ^a   Huai, Yiming ^a   Chen, Lifan ^a   Zhang, Jing ^a  

^a WESTERN DIGITAL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; DEPOSITION; ELECTRIC CONDUCTIVITY; FILM PREPARATION; ION BEAMS; MICROSTRUCTURE; NUMERICAL ANALYSIS; REFLECTION; SPUTTERING; THICKNESS MEASUREMENT; X RAY DIFFRACTION ANALYSIS;

BODY CENTERED CUBIC PHASE; ION BEAM SPUTTERING; X RAY REFLECTIVITY;

TANTALUM;

EID: 0037207726     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1535931     Document Type: Article

References (9)

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