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Volumn 518, Issue 24, 2010, Pages 7258-7262
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Effect of sputtering pressure and post-annealing on hydrophilicity of TiO2 thin films deposited by reactive magnetron sputtering
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Author keywords
High pressure sputtering; Hydrophilicity; Optical emission spectroscopy; TiO2 thin films
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Indexed keywords
ATOMIC FORCE SPECTROSCOPY;
EMPIRICAL STUDIES;
GLASS SUBSTRATES;
HIGH RESOLUTION;
HIGH-PRESSURE SPUTTERING;
IN-SITU;
KEY FACTORS;
OPTICAL EMISSIONS;
OXYGEN FLOW RATES;
POST ANNEALING;
REACTIVE MAGNETRON SPUTTERING;
REACTIVE MIXTURES;
SPUTTERING PRESSURES;
SUPER-HYDROPHILICITY;
THERMAL-ANNEALING;
TIO;
TITANIUM TARGETS;
WATER CONTACT ANGLE;
X RAY DIFFRACTOMETRY;
ATOMIC SPECTROSCOPY;
CONTACT ANGLE;
EMISSION SPECTROSCOPY;
HYDROPHILICITY;
LIGHT EMISSION;
OXYGEN;
PRESSURE EFFECTS;
SUBSTRATES;
THIN FILMS;
TITANIUM;
VAPOR DEPOSITION;
X RAY DIFFRACTION ANALYSIS;
OPTICAL EMISSION SPECTROSCOPY;
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EID: 77956886632
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2010.04.106 Document Type: Conference Paper |
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Times cited : (20)
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References (20)
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