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Volumn 97, Issue , 2007, Pages 109-124

Cold Plasma Technologies for Surface Modification and Thin Film Deposition

Author keywords

Cold Plasma; Cone Calorimeter; Physical Vapour Deposition; Plasma Technology; Surface Material Layer

Indexed keywords


EID: 77956650815     PISSN: 0933033X     EISSN: 21962812     Source Type: Book Series    
DOI: 10.1007/978-3-540-71920-5_6     Document Type: Chapter
Times cited : (5)

References (57)
  • 1
    • 85072859261 scopus 로고    scopus 로고
    • N. Inagaki, Plasma Surface Modification and Plasma Polymerisation. Interactions Between Plasma and Polymeric Materials (Technomic Publishing, Lancaster, 1996), Chap. 2, pp. 22–28
    • Inagaki, N.1
  • 21
    • 85072864566 scopus 로고    scopus 로고
    • B. Mutel, C. Jama, O. Dessaux et al., Vide: Science, Technique et Applications (1995), vol. 275(Suppl.), 10th International Colloquium on Plasma Processes, 1995, pp. 126–129
    • Mutel, B.1    Jama, C.2    Dessaux, O.3
  • 52
    • 85072871836 scopus 로고
    • Standard test method for heat and visible smoke release for materials and products using an oxygen depletion calorimeter
    • Philadelphia
    • Standard test method for heat and visible smoke release for materials and products using an oxygen depletion calorimeter, ASTM E 1354-90a (1990), Philadelphia
    • (1990) ASTM E 1354-90A
  • 54
    • 0001296902 scopus 로고
    • Analysis of Silicones. Infrared, Raman and Ultraviolet Spectroscopy (Wiley, New York
    • p
    • D.R. Anderson, Analysis of Silicones. Infrared, Raman and Ultraviolet Spectroscopy (Wiley, New York, 1974), Chap. 10, p. 247
    • (1974) Chap , vol.10 , pp. 247
    • Anderson, D.R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.