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Volumn 352-354, Issue , 1996, Pages 893-897

Ageing of an organosiloxane deposit in a cold remote nitrogen plasma: XPS investigation

Author keywords

Organosilicon; Scanning electron microscopy; X ray photoelectron spectroscopy

Indexed keywords

AGING OF MATERIALS; CHEMICAL BONDS; DEPOSITION; ETCHING; MIXTURES; MORPHOLOGY; NITROGEN; OXIDES; PLASMA APPLICATIONS; SILICONES; SURFACE STRUCTURE; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0030147855     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(95)01293-1     Document Type: Article
Times cited : (3)

References (15)
  • 14
    • 0027591863 scopus 로고
    • C. Jones, Surf. Interface Anal. 20 (1993) 357; S.L. Kaplan, E.S. Lapota and J. Smith, Surf. Interface Anal. 20 (1993) 331.
    • (1993) Surf. Interface Anal. , vol.20 , pp. 357
    • Jones, C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.