Barrier behavior hindering Zn++ diffusion from cold remote nitrogen plasma-deposited silicon films

Journal of Applied Polymer Science

Volumn 64, Issue 4, 1997, Pages 699-705

  Jama, C ^a   Asfardjani, K ^a   Dessaux, O ^a   Goudmand, P ^a  

^a UNIV LILLE   (France)

Author keywords

Barrier diffusion; Cold plasma; Diffusion; Organosiloxane; Plasma depositon; Remote nitrogen plasma; Thin films

Indexed keywords

DEPOSITION; DIFFUSION IN SOLIDS; METALLORGANIC POLYMERS; PLASMA APPLICATIONS; THIN FILMS;

BARRIER DIFFUSION; COLD REMOTE NITROGEN PLASMA DEPOSITION; ORGANOSILOXANE; TETRAMETHYLDISILOXANE (TMDS);

PLASTIC FILMS;

EID: 0031122446     PISSN: 00218995     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1097-4628(19970425)64:4<699::AID-APP9>3.0.CO;2-I     Document Type: Article

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