Deposition of SiO2-like diffusion barriers on PET and paper by PECVD

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 1043-1047

  Gruniger A ^a   Rudolf von Rohr, P ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

Diffusion barrier; Oxygen permeability; Paper; PECVD; Silicon oxide

Indexed keywords

MICROWAVES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA SOURCES; SILICA; SLOT ANTENNAS; SUBSTRATES;

OXYGEN PERMEABILITY;

POLYETHYLENE TEREPHTHALATES;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 0041326542     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00327-X     Document Type: Article

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