Growth and stability of CVD Ni3N and ALD NiO dual layers

Surface and Coatings Technology

Volumn 205, Issue 3, 2010, Pages 710-716

  Lindahl, Erik ^a   Ottosson, Mikael ^a   Carlsson, Jan Otto ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

Atomic layer deposition; Chemical vapour deposition; Multilayers; Nickel; Nickel nitride; Nickel oxide

Indexed keywords

CHEMICAL VAPOUR DEPOSITION; DUAL LAYER; HIGH RATE; HYDROGEN ATMOSPHERE; LAYER STRUCTURES; LOW TEMPERATURE ANNEALING; NI FILMS; REACTION ROUTES; SEED LAYER; SINGLE PHASE; TARGET STRUCTURE;

ATOMIC LAYER DEPOSITION; CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; MULTILAYERS; NICKEL; NICKEL OXIDE; NITRIDES;

FILM GROWTH;

EID: 77956648099     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.07.059     Document Type: Article

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